发明申请
- 专利标题： Device and method for melting a substance with the occurrence of a low level of contamination
- 专利标题（中）： 发生低水平污染物质的熔化装置和方法
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申请号： US10490803申请日： 2002-09-12
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公开(公告)号： US20050005646A1公开(公告)日： 2005-01-13
- 发明人: Michael Leister , Ernst-Walter Schafer , Leopold Eichberg , Volker Ohmstede
- 申请人： Michael Leister , Ernst-Walter Schafer , Leopold Eichberg , Volker Ohmstede
- 优先权： DE10148754.1 20011002; DE10149309.6 20011002; DE10202024.8 20020118
- 国际申请： PCT/EP02/10242 WO 20020912
- 主分类号： C03B5/06
- IPC分类号： C03B5/06 ; C03B1/02 ; C03B3/00 ; C03B5/02 ; C03B5/18 ; C03B5/187 ; C03B5/193 ; C03B5/20 ; C03B5/26 ; C03C3/097 ; C03C4/00
摘要：
An apparatus and a method for low-contamination melting of high-purity, aggressive and/or high-melting glass or glass-ceramic are provided. For this purpose, a melt is heated in a crucible or melting skull crucible by means of high-frequency radiation and is mixed or homogenized in the melting crucible. A gas nozzle, from which gas bubbles, e.g. oxygen bubbles (known as O2 bubbling), escape into the melt, is provided at the base of the crucible.