发明申请
US20050006663A1 Implant-controlled-channel vertical JFET 有权
植入物控制通道垂直JFET

Implant-controlled-channel vertical JFET
摘要:
We disclose the structure of an electronic device, the method of making the device and the operation of the device. The device is built near the top of a substrate. It has, near the top surface, a buried layer that is electrically communicable to a drain terminal. The device has a body region over the buried layer. A portion of the body region contacts a gate region connected to a gate terminal. The device has a channel region, of which the length spans the distance between the buried layer and a source region, which projects upward from the channel region and is connected to a source terminal. The device current flows in the channel substantially perpendicularly to the top surface of the substrate.
公开/授权文献
信息查询
0/0