发明申请
- 专利标题: Implant-controlled-channel vertical JFET
- 专利标题(中): 植入物控制通道垂直JFET
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申请号: US10614840申请日: 2003-07-08
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公开(公告)号: US20050006663A1公开(公告)日: 2005-01-13
- 发明人: Gregory Howard , Leland Swanson
- 申请人: Gregory Howard , Leland Swanson
- 主分类号: H01L21/337
- IPC分类号: H01L21/337 ; H01L29/10 ; H01L29/808 ; H01L29/74
摘要:
We disclose the structure of an electronic device, the method of making the device and the operation of the device. The device is built near the top of a substrate. It has, near the top surface, a buried layer that is electrically communicable to a drain terminal. The device has a body region over the buried layer. A portion of the body region contacts a gate region connected to a gate terminal. The device has a channel region, of which the length spans the distance between the buried layer and a source region, which projects upward from the channel region and is connected to a source terminal. The device current flows in the channel substantially perpendicularly to the top surface of the substrate.
公开/授权文献
- US06909125B2 Implant-controlled-channel vertical JFET 公开/授权日:2005-06-21
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