Invention Application
- Patent Title: Sintered silicon nitride
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Application No.: US10621168Application Date: 2003-07-15
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Publication No.: US20050014629A1Publication Date: 2005-01-20
- Inventor: Chien-Wei Li , Bjoern Schenk , James Guiheen
- Applicant: Chien-Wei Li , Bjoern Schenk , James Guiheen
- Applicant Address: US NJ Morristown
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morristown
- Main IPC: C04B35/593
- IPC: C04B35/593 ; F01D5/28 ; C04B35/587 ; C04B35/565

Abstract:
Sintered silicon nitride products comprising predominantly β-silicon nitride grains in combination with from about 0.1 to 30 mole % silicon carbide, and grain boundary secondary phases of scandium oxide and scandium disilicate. Such products have high fracture toughness, resistance to recession, and resistance to oxidation at temperatures of at least 1500° C. Methods for preparing sintered silicon nitride products are also disclosed.
Public/Granted literature
- US06977233B2 Sintered silicon nitride Public/Granted day:2005-12-20
Information query
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