发明申请
- 专利标题: Substrate holding technique
- 专利标题(中): 基材保持技术
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申请号: US10879074申请日: 2004-06-30
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公开(公告)号: US20050016685A1公开(公告)日: 2005-01-27
- 发明人: Keiji Emoto , Atsushi Ito
- 申请人: Keiji Emoto , Atsushi Ito
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 优先权: JP187432/2003(PAT.) 20030630
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03F9/00 ; H01L21/027 ; H01L21/683 ; H01L21/306 ; G03B27/58 ; G03B27/62
摘要:
Disclosed is a stage system that includes a stage for supporting and moving a substrate, and a probe for measuring a potential of a substrate without contact thereto, the probe being supported by the stage so as to be opposed to one of a bottom face and a side face of the substrate. Also disclosed is a stage system that includes a substrate holding member for holding a substrate, the substrate holding member having a protrusion and a first electrode, the first electrode being provided inside the substrate holding member and adjacent said protrusion, a terminal for adjusting a potential of said first electrode, and a stage for supporting and moving the substrate holding member through the terminal. Further, a substrate holding system is disclosed, that includes a plurality of protrusions to be supported by a stage, and a plurality of first electrodes disposed adjacent the plurality of protrusions, respectively, and for electrostatically attracting the stage.
公开/授权文献
- US07508646B2 Substrate holding technique 公开/授权日:2009-03-24
信息查询
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