Invention Application
- Patent Title: Atmospheric glow discharge with concurrent coating deposition
- Patent Title (中): 大气辉光放电同时进行涂层沉积
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Application No.: US10883167Application Date: 2004-07-01
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Publication No.: US20050020038A1Publication Date: 2005-01-27
- Inventor: Michael Mikhael , Angelo Yializis , Richard Ellwanger
- Applicant: Michael Mikhael , Angelo Yializis , Richard Ellwanger
- Main IPC: C23C16/30
- IPC: C23C16/30 ; C23C16/509 ; H01J37/32 ; H05H1/24 ; C30B1/00

Abstract:
A plasma is produced in a treatment space by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes separated by a dielectric material, a precursor material is mixed with the plasma, and a substrate film or web is coated by vapor deposition of the vaporized substance at atmospheric pressure in the plasma field. The deposited precursor is cured by electron-beam, infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being-deposited. Plasma pre-treatment and post-treatment steps are used to enhance the properties of the resulting coated products. Similar results are obtained by atomizing and spraying the liquid precursor in the plasma field.
Public/Granted literature
- US07067405B2 Atmospheric glow discharge with concurrent coating deposition Public/Granted day:2006-06-27
Information query
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