发明申请
- 专利标题： Advanced route for the synthesis of cPLA2 inhibitors
- 专利标题（中）： 用于合成cPLA2抑制剂的先进途径
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申请号： US10896318申请日： 2004-07-21
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公开(公告)号： US20050020858A1公开(公告)日： 2005-01-27
- 发明人: Yanzhong Wu , Panolil Raveendranath
- 申请人： Yanzhong Wu , Panolil Raveendranath
- 申请人地址： US NJ Madison
- 专利权人： Wyeth
- 当前专利权人： Wyeth
- 当前专利权人地址： US NJ Madison
- 主分类号： C07C303/38
- IPC分类号： C07C303/38 ; C07C303/40 ; C07C311/03 ; C07C311/05 ; C07C311/13 ; C07D209/14
摘要：
A process for making a compound of formula (I) in which process the compound HC≡C—(CH2)n—NH2 is reacted with the compound R1—SO2Cl to produce an intermediate compound, which intermediate compound is then reacted with the compound of formula to produce the compound of formula (I), and compounds produced by the process of this invention. The terms R1, R2, R3, R4 and n have the definitions set forth in the specification.
公开/授权文献
- US06891065B2 Advanced route for the synthesis of cPLA2 inhibitors 公开/授权日：2005-05-10
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