发明申请
- 专利标题： Lithographic apparatus and integrated circuit manufacturing method
- 专利标题（中）： 平版印刷设备和集成电路制造方法
-
申请号： US10876786申请日： 2004-06-25
-
公开(公告)号： US20050024611A1公开(公告)日： 2005-02-03
- 发明人: Pertrus Bartray , Wilhelmus Box , Dominicus Jacobus Franken , Bernardus Luttikhuis , Engelbertus Van Der Pasch , Marc Van Der Wijst , Marc Engels
- 申请人： Pertrus Bartray , Wilhelmus Box , Dominicus Jacobus Franken , Bernardus Luttikhuis , Engelbertus Van Der Pasch , Marc Van Der Wijst , Marc Engels
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP03077013.5 20030627
- 主分类号： G01B11/00
- IPC分类号： G01B11/00 ; G03F7/20 ; H01L21/027 ; G03B27/42 ; G03C5/00 ; G03F9/00
摘要：
A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.
公开/授权文献
信息查询
