公开(公告)号：US20060060799A1

公开(公告)日：2006-03-23

申请号：US11263012

申请日：2005-11-01

申请人： Dominicus Jacobus Franken ,  Erik Loopstra ,  Pertrus Bartray ,  Marc Van Der Wijst ,  Michael Jozefa Renkens ,  Gerard Van Schothorst ,  Johan Dries

发明人： Dominicus Jacobus Franken ,  Erik Loopstra ,  Pertrus Bartray ,  Marc Van Der Wijst ,  Michael Jozefa Renkens ,  Gerard Van Schothorst ,  Johan Dries

IPC分类号： G21K5/10

CPC分类号： G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.

摘要翻译： 光刻设备包括安装在参考框架上的投影系统，投影系统又安装在支撑设备的基座上。 基座中的振动和位移误差通过两组隔离安装件在基座和参考框架之间以及参考框架和投影系统的投影框架之间进行过滤，因此减小了投影系统的干扰。

公开(公告)号：US20050018154A1

公开(公告)日：2005-01-27

申请号：US10844570

申请日：2004-05-13

申请人： Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

发明人： Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

IPC分类号： G21K1/06 ,  G02B7/182 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G21K5/00

CPC分类号： G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.

摘要翻译： 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。

公开(公告)号：US20060139598A1

公开(公告)日：2006-06-29

申请号：US11019524

申请日：2004-12-23

申请人： Antonius Van Dijsseldonk ,  Dominicus Jacobus Adrianus Franken ,  Robertus De Jongh ,  Jacob Kleijn ,  Bastiaan Jansen ,  Marc Van Der Wijst

发明人： Antonius Van Dijsseldonk ,  Dominicus Jacobus Adrianus Franken ,  Robertus De Jongh ,  Jacob Kleijn ,  Bastiaan Jansen ,  Marc Van Der Wijst

IPC分类号： G03B27/54

CPC分类号： G03F7/709 ,  G03F7/70266 ,  G03F7/70825

摘要： A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.

摘要翻译： 光刻设备包括包括可移动光学元件的投影系统。 可移动光学元件能够通过其位移来影响由投影系统投射的辐射束的位置量。 提供控制装置以驱动光学元件致动器来影响可移动光学元件的位置量，从而影响由投影系统投射的辐射束的位置量。 控制装置适于移动可移动光学元件以将投影系统相对于基板投射的辐射束定位，或者校正由任何类型的扰动引起的由投影系统投影的辐射束的位置量 在投影系统上。

公开(公告)号：US20050024611A1

公开(公告)日：2005-02-03

申请号：US10876786

申请日：2004-06-25

申请人： Pertrus Bartray ,  Wilhelmus Box ,  Dominicus Jacobus Franken ,  Bernardus Luttikhuis ,  Engelbertus Van Der Pasch ,  Marc Van Der Wijst ,  Marc Engels

发明人： Pertrus Bartray ,  Wilhelmus Box ,  Dominicus Jacobus Franken ,  Bernardus Luttikhuis ,  Engelbertus Van Der Pasch ,  Marc Van Der Wijst ,  Marc Engels

IPC分类号： G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03C5/00 ,  G03F9/00

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于将图案化的辐射束投影到基板的目标部分上的投影系统和用于确定图案形成装置相对于投影系统的空间位置的组件。 组件包括具有安装在投影系统上的多个传感器的测量单元。

公开(公告)号：US07307262B2

公开(公告)日：2007-12-11

申请号：US11019524

申请日：2004-12-23

申请人： Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Robertus Johannes Marinus De Jongh ,  Jacob Kleijn ,  Bastiaan S H Jansen ,  Marc Van Der Wijst

发明人： Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Robertus Johannes Marinus De Jongh ,  Jacob Kleijn ,  Bastiaan S H Jansen ,  Marc Van Der Wijst

IPC分类号： G21G5/00

CPC分类号： G03F7/709 ,  G03F7/70266 ,  G03F7/70825

摘要： A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.

摘要翻译： 光刻设备包括包括可移动光学元件的投影系统。 可移动光学元件能够通过其位移来影响由投影系统投射的辐射束的位置量。 提供控制装置以驱动光学元件致动器来影响可移动光学元件的位置量，从而影响由投影系统投射的辐射束的位置量。 控制装置适于移动可移动光学元件以将投影系统相对于基板投射的辐射束定位，或者校正由任何类型的扰动引起的由投影系统投影的辐射束的位置量 在投影系统上。