发明申请
- 专利标题: Plasma processor
- 专利标题(中): 等离子处理器
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申请号: US10498672申请日: 2002-11-25
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公开(公告)号: US20050034815A1公开(公告)日: 2005-02-17
- 发明人: Shigeru Kasai , Nobuhiko Yamamoto , Hikaru Adachi , Yuki Osada
- 申请人: Shigeru Kasai , Nobuhiko Yamamoto , Hikaru Adachi , Yuki Osada
- 优先权: JP2001-381539 20011214
- 国际申请: PCT/JP02/12279 WO 20021125
- 主分类号: H05H1/46
- IPC分类号: H05H1/46 ; C23C16/511 ; H01J37/32 ; H01L21/205 ; H01P5/103 ; C23F1/00
摘要:
A plasma processor with a microwave generating source mounted integrally on a shield lid by miniaturizing a matching circuit. The plasma processor is characterized by comprising a evacuatable processing vessel (42), a workpiece mount base (44) provided in the processing vessel, a microwave transmitting plate (70) provided in the opening section of the top of the processing vessel, a plane antenna member (74) for supplying a microwave into the processing vessel via the microwave transmitting plate, a shield lid (78) so grounded as to cover the top of the plane antenna member, a waveguide (82) for guiding the microwave from a microwave generating source to the plane antenna member, a member elevating mechanism (85) for relatively varying the vertical distance between the plane antenna member and the shield lid, a tuning rod (104) so provided insertably into the waveguide tube, a tuning rod drive mechanism (102) so moving the tuning rod as to adjust its insert amount, and a matching control section (114) for matching adjustment by controlling the elevation amount of the antenna member and the insert amount of the tuning rod.
公开/授权文献
- US07226524B2 Plasma processing apparatus 公开/授权日:2007-06-05
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