Invention Application
- Patent Title: Magnetic tunnel junction structure having an oxidized buffer layer and method of fabricating the same
- Patent Title (中): 具有氧化缓冲层的磁隧道结结构及其制造方法
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Application No.: US10915872Application Date: 2004-08-10
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Publication No.: US20050035386A1Publication Date: 2005-02-17
- Inventor: Young-Ki Ha , Jang-Eun Lee , Hyun-Jo Kim , Se-Chung Oh , Jun-Soo Bae , In-Gyu Baek
- Applicant: Young-Ki Ha , Jang-Eun Lee , Hyun-Jo Kim , Se-Chung Oh , Jun-Soo Bae , In-Gyu Baek
- Priority: KR2003-55559 20030811
- Main IPC: G11C11/15
- IPC: G11C11/15 ; H01L21/00 ; H01L43/08 ; H01L43/12

Abstract:
There are provided a magnetic tunnel junction structure and a method of fabricating the same. The magnetic tunnel junction structure includes a lower electrode, a lower magnetic layer pattern and a tunnel layer pattern, which are sequentially formed on the lower electrode. The magnetic tunnel junction structure further includes an upper magnetic layer pattern, a buffer layer pattern, and an upper electrode, which are sequentially formed on a portion of the tunnel layer pattern. The sidewall of the upper magnetic layer pattern is surrounded by an oxidized upper magnetic layer, and the sidewall of the buffer layer pattern is surrounded by an oxidized buffer layer. The depletion of the upper magnetic layer pattern and the lower magnetic layer pattern in the magnetic tunnel junction region can be prevented by the oxidized buffer layer.
Public/Granted literature
- US07141438B2 Magnetic tunnel junction structure having an oxidized buffer layer and method of fabricating the same Public/Granted day:2006-11-28
Information query