发明申请
US20050045091A1 Molecular beam epitaxy growth apparatus and method of controlling same
审中-公开
分子束外延生长装置及其控制方法
- 专利标题: Molecular beam epitaxy growth apparatus and method of controlling same
- 专利标题(中): 分子束外延生长装置及其控制方法
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申请号: US10915321申请日: 2004-08-11
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公开(公告)号: US20050045091A1公开(公告)日: 2005-03-03
- 发明人: Takashi Kawasaki
- 申请人: Takashi Kawasaki
- 申请人地址: JP Osaka
- 专利权人: Sharp Kabushiki Kaisha
- 当前专利权人: Sharp Kabushiki Kaisha
- 当前专利权人地址: JP Osaka
- 优先权: JP2003-300078 20030825
- 主分类号: C30B23/08
- IPC分类号: C30B23/08 ; C30B23/02 ; C30B29/42 ; C30B35/00 ; H01L21/203 ; C30B23/00 ; C30B1/00 ; C30B25/00 ; C30B28/12 ; C30B28/14
摘要:
In system(s) utilizing multiple molecular beams of Group V material(s) (and/or Group VI material(s)), rotary beam chopper(s)) 8 and so forth are installed in front of respective discharge port(s) of such plurality of Group V molecular beam source cell(s) 5, 6 (and/or Group VI molecular beam source cell(s)); intermittency control causing molecular beam(s)) discharged from respective molecular beam source cell(s) 5, 6 to be repeatedly blocked and discharged in periodic fashion is carried out; and mutual synchronization of such molecular beam(s)) subjected to intermittency control causes supply of respective molecular beam(s)) of multiple Group V materials (and/or Group VI materials) in sufficient quantity or quantities as necessary for crystal growth, with alloy ratio(s) within crystal(s) being efficiently controlled.
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