发明申请
US20050047985A1 Silica 有权
二氧化硅

  • 专利标题: Silica
  • 专利标题(中): 二氧化硅
  • 申请号: US10255140
    申请日: 2002-09-25
  • 公开(公告)号: US20050047985A1
    公开(公告)日: 2005-03-03
  • 发明人: Yutaka MoriHanako KatoKatsuya Funayama
  • 申请人: Yutaka MoriHanako KatoKatsuya Funayama
  • 优先权: JP2001-291966 20010925; JP2001-291967 20010925; JP2001-291968 20010925; JP2001-291969 20010925; JP2001-291970 20010925; JP2001-293484 20010926; JP2001-358567 20011122; JP2001-358568 20011122; JP2001-379228 20011212
  • 主分类号: C01B33/152
  • IPC分类号: C01B33/152 C01B33/158 C01B33/12
Silica
摘要:
Silica with a large pore volume, a large specific surface area, a narrow pore distribution, low contents of unwanted metal impurities, and excellent physical properties such as high heat-resistance and water-resistance is provided. The silica has a mode pore diameter (Dmax) of 20 nm or less, and a solid-state Si nuclear magnetic resonance (hereinafter called solid-state Si NMR) spectrum of the silica includes a chemical shift (δ ppm) of Q4 peak meeting the following inequality (I). −0.0705×(Dmax)−110.36>δ  (I) The silica with such properties can be suitably used in fields of which particularly excellent heat resistance and water resistance are required, and moreover controlled pore properties, and the fact that physical properties scarcely change over a long period of time are required among the above-mentioned applications.
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