发明申请
US20050058948A1 Systems and methods for mastering microstructures through a substrate using negative photoresist and microstructure masters so produced
有权
通过使用负性光致抗蚀剂和如此生产的微结构主体的基板来掌握微结构的系统和方法
- 专利标题: Systems and methods for mastering microstructures through a substrate using negative photoresist and microstructure masters so produced
- 专利标题(中): 通过使用负性光致抗蚀剂和如此生产的微结构主体的基板来掌握微结构的系统和方法
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申请号: US10661917申请日: 2003-09-11
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公开(公告)号: US20050058948A1公开(公告)日: 2005-03-17
- 发明人: Robert Freese , Thomas Rinehart , Robert Wood
- 申请人: Robert Freese , Thomas Rinehart , Robert Wood
- 主分类号: G02B3/00
- IPC分类号: G02B3/00 ; G02B5/18 ; G03F7/00 ; G03F7/20 ; G03F7/24
摘要:
Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems, microstructure products and microstructure masters also are disclosed.
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