发明申请
- 专利标题: Electron beam system and electron beam measuring and observing methods
- 专利标题(中): 电子束系统和电子束测量和观测方法
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申请号: US10897434申请日: 2004-07-23
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公开(公告)号: US20050061972A1公开(公告)日: 2005-03-24
- 发明人: Nobuo Kochi , Hirotami Koike , Yasuko Tsuruga , Shinichi Okada
- 申请人: Nobuo Kochi , Hirotami Koike , Yasuko Tsuruga , Shinichi Okada
- 专利权人: TOPCON CORPORATION
- 当前专利权人: TOPCON CORPORATION
- 优先权: JP2003-279386 20030724; JP2003-305191 20030828
- 主分类号: H01J37/28
- IPC分类号: H01J37/28 ; G01N23/00
摘要:
To provide an electron beam system capable of performing three-dimensional measurement of a sample with high precision irrespective of the tilt angle and height of the sample. The electron beam system has a correction factor storing section 32 for storing a correction factor at a reference tilt angle with respect to a plane which is used to tilt a sample by a sample tilting section 5, an approximate coordinate measuring section 28 for obtaining an approximate shape or approximate coordinate values of the sample based on an output corresponding to a stereo image from an electron beam detecting section 4, an image correcting section 30 for correcting the stereo image according to the tilt angle created by the sample tilting section 5 based on the shape or coordinate values of the sample obtained in the approximate coordinate measuring section 28 using a correction factor stored in the correction factor storing section 32, and a precise coordinate measuring section 34 for obtaining a shape or coordinate values of the sample which are more precise than those obtained in the approximate coordinate measuring section 28 based on a corrected stereo image obtained in the image correcting section 30.
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