发明申请
- 专利标题: Lithographic apparatus and apparatus adjustment method
- 专利标题(中): 平版印刷设备和设备调整方法
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申请号: US10915702申请日: 2004-08-11
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公开(公告)号: US20050061995A1公开(公告)日: 2005-03-24
- 发明人: Jacob Vink , Sjoerd Donders , Theodorus Modderman , Theodorus Cadee
- 申请人: Jacob Vink , Sjoerd Donders , Theodorus Modderman , Theodorus Cadee
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 优先权: EP03077530.8 20030812
- 主分类号: H01L21/683
- IPC分类号: H01L21/683 ; G03F7/20 ; H01L21/027 ; G21G5/00
摘要:
A lithographic projection apparatus includes a beam production system for projecting a patterned beam of radiation onto a target portion of a substrate, and a support table for supporting an article. The support table has a support surface and an array of protrusions extending from the support surface to support the article on the protrusions. The apparatus also includes a detector for detecting height deviations of the protrusions that affect a surface flatness of the article, a height adjustment device arranged to independently modify a height of the individual protrusions when the support table is operable in the apparatus, and a controller coupled between the detector and the height adjustment device and arranged to control the height adjustment device to adjust the height of the protrusions corresponding to the detected height deviations of the protrusions that affect the surface flatness of the article.
公开/授权文献
- US07078715B2 Lithographic apparatus and apparatus adjustment method 公开/授权日:2006-07-18
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