公开(公告)号：US20060232756A1

公开(公告)日：2006-10-19

申请号：US11239480

申请日：2005-09-30

Applicant: Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen ,  Sjoerd Nicolaas Donders

Inventor： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen ,  Sjoerd Nicolaas Donders

IPC: G03B27/42

CPC classification number: G03F7/70341

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

Abstract translation: 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。

公开(公告)号：US20050134816A1

公开(公告)日：2005-06-23

申请号：US10740824

申请日：2003-12-22

Applicant: Theodorus Modderman ,  Nicolaas Antonius Allegondus Van Asten ,  Gerrit Nijmeijer

Inventor： Theodorus Modderman ,  Nicolaas Antonius Allegondus Van Asten ,  Gerrit Nijmeijer

IPC: G03F9/00 ,  G03B27/42

CPC classification number: G03F9/7053 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7049

Abstract: A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of at least one substrate with a first and second sensor, generating and storing an offset error map based on a difference between the measurements; generating and storing a height map of portions of the substrate (or another substrate that has had a similar processing as the part) by performing height measurements with the first sensor and correcting this height map by means of the offset error map; and exposing the substrate (or the other substrate).

Abstract translation: 根据本发明的一个实施例的曝光衬底（例如，在包括衬底台的光刻设备中以支撑衬底）的方法包括使用第一和第二传感器执行至少一个衬底的一部分的第一和第二高度测量 基于所述测量之间的差产生和存储偏移误差图; 通过利用第一传感器执行高度测量并通过偏移误差图校正该高度图来生成和存储基板（或具有与该部分相似的处理的另一基板）的部分的高度图; 并使基板（或另一个基板）曝光。

公开(公告)号：US20050088638A1

公开(公告)日：2005-04-28

申请号：US10975429

申请日：2004-10-29

Applicant: Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicolaas van Asten ,  Frederik Heuts ,  Jacobus Geman ,  Richard Du Croo de Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

Inventor： Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicolaas van Asten ,  Frederik Heuts ,  Jacobus Geman ,  Richard Du Croo de Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

IPC: G01B9/02 ,  G01B11/00 ,  G01B11/02 ,  G01B11/245 ,  G01B11/25 ,  G01B11/30 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

公开(公告)号：US20060176459A1

公开(公告)日：2006-08-10

申请号：US11324754

申请日：2006-01-04

Applicant: Theodorus Modderman ,  Gerrit Nijmeijer ,  Johannes Jasper

Inventor： Theodorus Modderman ,  Gerrit Nijmeijer ,  Johannes Jasper

IPC: G03B27/52

CPC classification number: G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

Abstract translation: 在离轴调平程序中，在测量站产生衬底的高度图。 高度图参考衬底台的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定衬底台的最佳高度和/或倾斜，以在曝光期间以最佳聚焦将曝光区域定位在衬底上。 相同的原理可以应用于（反射）掩模。

公开(公告)号：US20060132733A1

公开(公告)日：2006-06-22

申请号：US11015766

申请日：2004-12-20

Applicant: Theodorus Modderman

Inventor： Theodorus Modderman

IPC: G03B27/42

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/7075

Abstract: In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate table exchange and/or substrate loading and unloading.

公开(公告)号：US20060023189A1

公开(公告)日：2006-02-02

申请号：US11239493

申请日：2005-09-30

Applicant: Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

Inventor： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

公开(公告)号：US20070040133A1

公开(公告)日：2007-02-22

申请号：US11371235

申请日：2006-03-09

Applicant: Joeri Lof ,  Joannes De Smit ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Hendricus Johannes Meijer ,  Erik Roelof Loopstra

Inventor： Joeri Lof ,  Joannes De Smit ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Hendricus Johannes Meijer ,  Erik Roelof Loopstra

IPC: G01N21/86 ,  G01V8/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

Abstract translation: 在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。

公开(公告)号：US20050157281A1

公开(公告)日：2005-07-21

申请号：US10918700

申请日：2004-08-16

Applicant: Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicholaas Van Asten ,  Frederik Heuts ,  Jacobus Gemen ,  Richard Du Croo De Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

Inventor： Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicholaas Van Asten ,  Frederik Heuts ,  Jacobus Gemen ,  Richard Du Croo De Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

IPC: G01B9/02 ,  G01B11/00 ,  G01B11/02 ,  G01B11/245 ,  G01B11/25 ,  G01B11/30 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

公开(公告)号：US20050061995A1

公开(公告)日：2005-03-24

申请号：US10915702

申请日：2004-08-11

Applicant: Jacob Vink ,  Sjoerd Donders ,  Theodorus Modderman ,  Theodorus Cadee

Inventor： Jacob Vink ,  Sjoerd Donders ,  Theodorus Modderman ,  Theodorus Cadee

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  G21G5/00

CPC classification number: G03F7/707 ,  G03F7/70783 ,  G03F7/70925 ,  G03F7/70975

Abstract: A lithographic projection apparatus includes a beam production system for projecting a patterned beam of radiation onto a target portion of a substrate, and a support table for supporting an article. The support table has a support surface and an array of protrusions extending from the support surface to support the article on the protrusions. The apparatus also includes a detector for detecting height deviations of the protrusions that affect a surface flatness of the article, a height adjustment device arranged to independently modify a height of the individual protrusions when the support table is operable in the apparatus, and a controller coupled between the detector and the height adjustment device and arranged to control the height adjustment device to adjust the height of the protrusions corresponding to the detected height deviations of the protrusions that affect the surface flatness of the article.

Abstract translation: 光刻投影装置包括用于将图案化的辐射束投射到基板的目标部分上的光束产生系统和用于支撑物品的支撑台。 支撑台具有从支撑表面延伸的支撑表面和突出的阵列，以将物品支撑在突起上。 该装置还包括检测器，用于检测影响物品的表面平坦度的突起的高度偏差;高度调节装置，其布置成当支撑台在装置中可操作时独立地改变各个突起的高度;以及控制器 在所述检测器和所述高度调节装置之间，并布置成控制所述高度调节装置，以根据检测到的突出物的高度偏差来调节所述突起的高度，所述高度偏差影响所述物品的表面平坦度。

公开(公告)号：US20050024609A1

公开(公告)日：2005-02-03

申请号：US10860662

申请日：2004-06-04

Applicant: Joannes De Smit ,  Vadim Banine ,  Theodorus Josephus Bisschops ,  Marcel Mathijs Dierichs ,  Theodorus Modderman

Inventor： Joannes De Smit ,  Vadim Banine ,  Theodorus Josephus Bisschops ,  Marcel Mathijs Dierichs ,  Theodorus Modderman

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/00 ,  G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/708 ,  G03F7/70858

Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

Abstract translation: 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。