发明申请
- 专利标题: Method and its apparatus for inspecting a pattern
- 专利标题(中): 检查图案的方法及其装置
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申请号: US10914115申请日: 2004-08-10
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公开(公告)号: US20050062963A1公开(公告)日: 2005-03-24
- 发明人: Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama
- 申请人: Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama
- 优先权: JP2003-325526 20030918
- 主分类号: G01B11/30
- IPC分类号: G01B11/30 ; G01N21/47 ; G01N21/95 ; G01N21/956 ; G06T1/00 ; H01L21/027 ; H01L21/66 ; G01N21/00 ; G01J1/42
摘要:
An apparatus for inspecting a defect, has a light source; a rotating diffuser plate for reducing coherence of light emitted from the light source after its light intensity was adjusted and its illumination range is formed; oscillating mirrors that variably change the beam whose coherence was reduced on a pupil, irradiates it onto a wafer, and forms an image thereof. An image sensor images the wafer by focusing reflected light from the wafer and detects an image signal; a camera observes the detected image; and an image processing unit detects a defect of a pattern formed on the wafer based on the detected image signal. Thus, conditions for illuminating the sample can be changed variably in an arbitrary and easy manner, and a more minute defect can be detected with high sensitivity by changing transmissivity and phase conditions of a pupil filter on the detection side.
公开/授权文献
- US07295305B2 Method and its apparatus for inspecting a pattern 公开/授权日:2007-11-13
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