Invention Application
- Patent Title: Photosensitive composition and lithographic printing plate precursor using the same
- Patent Title (中): 光敏组合物和使用其的平版印刷版前体
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Application No.: US10947260Application Date: 2004-09-23
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Publication No.: US20050064331A1Publication Date: 2005-03-24
- Inventor: Hiromitsu Yanaka , Takahiro Goto
- Applicant: Hiromitsu Yanaka , Takahiro Goto
- Assignee: FUJI PHOTO FILM CO., LTD.
- Current Assignee: FUJI PHOTO FILM CO., LTD.
- Priority: JPP.2003-331528 20030924
- Main IPC: G03F7/027
- IPC: G03F7/027 ; B41C1/10 ; B41M5/36 ; G03F7/00 ; G03F7/038 ; G03C1/492 ; G03C1/005 ; G03F7/26
Abstract:
A photosensitive composition comprising: (A) a polymerizable compound represented by the following formula (I): A—{O—[(CH(—R1)CH(—R2))m—O]n—C(═O)—C(—R3)═CH2]P (I) wherein R1, R2and R3 each represents a hydrogen atom or a methyl group, A represents a polyhydric alcohol residue or a polyhydric phenol residue, m represents an integer of from 1 to 6, n represents an integer of from 1 to 20, and represents an integer of from 1 to 6; (B) an infrared absorber; and (C) an onium salt.
Public/Granted literature
- US07279266B2 Photosensitive composition and lithographic printing plate precursor using the same Public/Granted day:2007-10-09
Information query
IPC分类:
