发明申请
- 专利标题: Method for manufacturing master disk for magnetic transfer
- 专利标题(中): 制造用于磁转移的主磁盘的方法
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申请号: US10900401申请日: 2004-07-28
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公开(公告)号: US20050069634A1公开(公告)日: 2005-03-31
- 发明人: Hiroyuki Yoshimura
- 申请人: Hiroyuki Yoshimura
- 优先权: JPJPPA2003-333958 20030925
- 主分类号: G11B21/10
- IPC分类号: G11B21/10 ; G11B5/82 ; G11B5/84 ; G11B5/851 ; G11B5/858 ; G11B5/86 ; B05D5/12
摘要:
A method for manufacturing a master disk for magnetic transfer, with which a soft magnetic material can be evenly embedded in the grooves of a master disk. A patterned groove is formed on the main surface of a silicon substrate, which is the substrate of a magnetic transfer master disk. A conductive thin film is formed on the main surface of the silicon substrate and the groove surfaces. With this conductive thin film as one electrode, a plating film of a soft magnetic material is deposited on the main surface of the silicon substrate and inside the grooves, on the bottom and sidewalls thereof, by electroplating. Then, just the soft magnetic material deposited on the main surface of the silicon substrate is removed by CMP, causing the soft magnetic material in the interior of the grooves to remain.
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