Invention Application
- Patent Title: Rapid chemical charging of metal hydrides
- Patent Title (中): 金属氢化物快速化学充电
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Application No.: US10684616Application Date: 2003-10-14
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Publication No.: US20050079129A1Publication Date: 2005-04-14
- Inventor: Srinivasan Venkatesan , Stanford Ovshinsky , Subhash Dhar , Hong Wang
- Applicant: Srinivasan Venkatesan , Stanford Ovshinsky , Subhash Dhar , Hong Wang
- Main IPC: C01B3/00
- IPC: C01B3/00 ; C01B3/06

Abstract:
The present invention discloses a method and system for charging a metal hydride bed, wherein the metal hydride bed contains a hydrogen storage material. The metal hydride bed is charged using a chemical hydride slurry having a metal hydride, a stabilizing agent and water. As the slurry contacts the metal hydride bed, a catalyst in the metal hydride bed promotes a reaction between the metal hydride of the slurry and water. The reaction produces atomic hydrogen and byproducts. At least a portion of the atomic hydrogen is absorbed by the hydrogen storage material and the remaining atomic hydrogen is disposed from the system or used as fuel in a hydrogen fueled apparatus, such as a fuel cell.
Information query