发明申请
- 专利标题： Resist compositions and patterning process
- 专利标题（中）： 抗蚀剂组合物和图案化工艺
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申请号： US10925014申请日： 2004-08-25
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公开(公告)号： US20050084796A1公开(公告)日： 2005-04-21
- 发明人: Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
- 申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
- 申请人地址： JP Tokyo JP Kadoma-Shi JP Ube-Shi
- 专利权人： Shin-Etsu Chemical Co., Ltd.,Matsushita Electric Industrial Co., Ltd.,Central Glass Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.,Matsushita Electric Industrial Co., Ltd.,Central Glass Co., Ltd.
- 当前专利权人地址： JP Tokyo JP Kadoma-Shi JP Ube-Shi
- 优先权： JP2003-301500 20030826
- 主分类号： G03C1/494
- IPC分类号： G03C1/494 ; G03F7/00 ; G03F7/004 ; G03F7/039 ; H01L21/027
摘要：
A resist composition comprising a blend of a cyclic polymer having alcoholic groups as soluble groups and a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.
公开/授权文献
- US07001707B2 Resist compositions and patterning process 公开/授权日：2006-02-21
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