Invention Application
- Patent Title: Programming method of a non-volatile memory device having a charge storage layer between a gate electrode and a semiconductor substrate
- Patent Title (中): 在栅电极和半导体衬底之间具有电荷存储层的非易失性存储器件的编程方法
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Application No.: US10971201Application Date: 2004-10-21
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Publication No.: US20050088879A1Publication Date: 2005-04-28
- Inventor: Ki-Chul Kim , Byou-Ree Lim , Sang-Su Kim , Geum-Jong Bae , Kwang-Wook Koh
- Applicant: Ki-Chul Kim , Byou-Ree Lim , Sang-Su Kim , Geum-Jong Bae , Kwang-Wook Koh
- Priority: KR2003-74001 20031022
- Main IPC: H01L27/115
- IPC: H01L27/115 ; G11C16/04 ; G11C11/34

Abstract:
A programming method of a non-volatile memory device includes a pre-program of the non-volatile memory device, and a main-program of the pre-programmed non-volatile memory device. The non-volatile memory device may include a tunnel dielectric layer, a charge storage layer, a blocking dielectric layer, and a gate electrode, which are sequentially stacked on a semiconductor substrate. The charge storage layer may be an electrically-floated conductive layer, or a dielectric layer having a trap site. By performing a main-program after performing a pre-program, to increase the threshold voltage of the non-volatile memory device, the program current can be effectively reduced.
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