Invention Application
US20050088879A1 Programming method of a non-volatile memory device having a charge storage layer between a gate electrode and a semiconductor substrate 失效
在栅电极和半导体衬底之间具有电荷存储层的非易失性存储器件的编程方法

Programming method of a non-volatile memory device having a charge storage layer between a gate electrode and a semiconductor substrate
Abstract:
A programming method of a non-volatile memory device includes a pre-program of the non-volatile memory device, and a main-program of the pre-programmed non-volatile memory device. The non-volatile memory device may include a tunnel dielectric layer, a charge storage layer, a blocking dielectric layer, and a gate electrode, which are sequentially stacked on a semiconductor substrate. The charge storage layer may be an electrically-floated conductive layer, or a dielectric layer having a trap site. By performing a main-program after performing a pre-program, to increase the threshold voltage of the non-volatile memory device, the program current can be effectively reduced.
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