发明申请
- 专利标题: High density cobalt-manganese coprecipitated nickel hydroxide and process for its production
- 专利标题(中): 高密度钴锰共沉淀氢氧化镍及其生产工艺
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申请号: US10985778申请日: 2004-11-10
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公开(公告)号: US20050089756A1公开(公告)日: 2005-04-28
- 发明人: Hiroyuki Ito , Takeshi Usui , Mamoru Shimakawa , Toyoshi Iida
- 申请人: Hiroyuki Ito , Takeshi Usui , Mamoru Shimakawa , Toyoshi Iida
- 申请人地址: JP Fukui-shi
- 专利权人: Tanaka Chemical Corporation
- 当前专利权人: Tanaka Chemical Corporation
- 当前专利权人地址: JP Fukui-shi
- 优先权: JP2000-337873 20001106
- 主分类号: C01G53/00
- IPC分类号: C01G53/00 ; H01B1/08 ; H01M4/50 ; H01M4/505 ; H01M4/52 ; H01M4/525 ; H01M10/0525 ; H01M10/36 ; C01G53/04 ; H01M4/32 ; H01M4/58
摘要:
The present invention provides high density cobalt-manganese coprecipitated nickel hydroxide, particularly having a tapping density of 1.5 g/cc or greater, and a process for its production characterized by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal.
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