Invention Application
US20050092722A1 Target isolation system, high power laser and laser peening method and system using same
有权
目标隔离系统，大功率激光和激光喷丸方法及系统使用相同
- Patent Title: Target isolation system, high power laser and laser peening method and system using same
- Patent Title (中): 目标隔离系统，大功率激光和激光喷丸方法及系统使用相同
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Application No.: US10789557Application Date: 2004-02-27
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Publication No.: US20050092722A1Publication Date: 2005-05-05
- Inventor: C. Dane , Lloyd Hackel , Fritz Harris
- Applicant: C. Dane , Lloyd Hackel , Fritz Harris
- Applicant Address: US CA Oakland US NJ Paramus
- Assignee: The Regents of the University of California,Metal Improvement Company, Inc.
- Current Assignee: The Regents of the University of California,Metal Improvement Company, Inc.
- Current Assignee Address: US CA Oakland US NJ Paramus
- Main IPC: B23K26/06
- IPC: B23K26/06 ; C21D10/00 ; H01S3/10 ; H01S3/23
Abstract:
A system for applying a laser beam to work pieces, includes a laser system producing a high power output beam. Target delivery optics are arranged to deliver the output beam to a target work piece. A relay telescope having a telescope focal point is placed in the beam path between the laser system and the target delivery optics. The relay telescope relays an image between an image location near the output of the laser system and an image location near the target delivery optics. A baffle is placed at the telescope focal point between the target delivery optics and the laser system to block reflections from the target in the target delivery optics from returning to the laser system and causing damage.
Public/Granted literature
- US07291805B2 Target isolation system, high power laser and laser peening method and system using same Public/Granted day:2007-11-06
Information query
IPC分类:
