Invention Application
- Patent Title: Method and apparatus for inspecting defects
- Patent Title (中): 检查缺陷的方法和装置
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Application No.: US10903852Application Date: 2004-07-30
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Publication No.: US20050094137A1Publication Date: 2005-05-05
- Inventor: Joung-Soo Kim , Yu-Sin Yang , Moon-Kyung Kim , Sang-Mun Chon , Sun-Yong Choi , Chung-Sam Jun
- Applicant: Joung-Soo Kim , Yu-Sin Yang , Moon-Kyung Kim , Sang-Mun Chon , Sun-Yong Choi , Chung-Sam Jun
- Priority: KR2003-53537 20030801
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01N21/00 ; G01N21/55 ; G01N21/95

Abstract:
In a method for inspecting a defect in accordance with one aspect of the present invention, an object is divided into a plurality of regions. Reflectivity of each of the plurality of regions is obtained. Amplification ratio for each region is determined using the reflectivity. A light is irradiated onto the regions. A light reflected from a first region is amplified by a first amplification ratio that is determined for the first region. Moving the irradiated light from the first region to a second region is detected. A light reflected from the second region is amplified by a second amplification ratio that is determined for the second region. The amplified lights from the first region and the second region are analyzed to determine an existence of a defect on the object.
Public/Granted literature
- US07271890B2 Method and apparatus for inspecting defects Public/Granted day:2007-09-18
Information query
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