Invention Application
- Patent Title: Accommodating diffraction in the printing of features on a substrate
- Patent Title (中): 在基板上的特征印刷中适应衍射
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Application No.: US10698782Application Date: 2003-10-31
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Publication No.: US20050097502A1Publication Date: 2005-05-05
- Inventor: Rex Frost , Swaminathan Sivakumar
- Applicant: Rex Frost , Swaminathan Sivakumar
- Main IPC: G03F1/14
- IPC: G03F1/14 ; G06F17/50 ; G03F9/00

Abstract:
Systems and techniques for accommodating diffraction in the printing of features on a substrate. In one implementation, a method includes identifying a pair of features to be printed using a corresponding pair of patterning elements and increasing a separation distance between the pair of patterning elements while maintaining the sufficiently small pitch between the corresponding imaged features. The pitch of the pair of features can be sufficiently small that, upon printing, diffraction will make a separation between the features smaller than a separation between the corresponding pair of patterning elements.
Public/Granted literature
- US07288344B2 Accommodating diffraction in the printing of features on a substrate Public/Granted day:2007-10-30
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