Invention Application
US20050097502A1 Accommodating diffraction in the printing of features on a substrate 有权
在基板上的特征印刷中适应衍射

Accommodating diffraction in the printing of features on a substrate
Abstract:
Systems and techniques for accommodating diffraction in the printing of features on a substrate. In one implementation, a method includes identifying a pair of features to be printed using a corresponding pair of patterning elements and increasing a separation distance between the pair of patterning elements while maintaining the sufficiently small pitch between the corresponding imaged features. The pitch of the pair of features can be sufficiently small that, upon printing, diffraction will make a separation between the features smaller than a separation between the corresponding pair of patterning elements.
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