发明申请
US20050098264A1 Molecular airborne contaminants (MACs) film removal and wafer surface sustaining system and method
审中-公开
分子空气污染物（MAC）膜去除和晶圆表面维持系统及方法
- 专利标题： Molecular airborne contaminants (MACs) film removal and wafer surface sustaining system and method
- 专利标题（中）： 分子空气污染物（MAC）膜去除和晶圆表面维持系统及方法
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申请号： US10966125申请日： 2004-10-14
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公开(公告)号： US20050098264A1公开(公告)日： 2005-05-12
- 发明人: Robert Wolf , Michael Darwin
- 申请人： Robert Wolf , Michael Darwin
- 专利权人： Rudolph Technologies, Inc.
- 当前专利权人： Rudolph Technologies, Inc.
- 主分类号： C23F1/00
- IPC分类号： C23F1/00 ; C25F1/00 ; H01L20060101 ; H01L21/00 ; H01L21/02
摘要：
A MACs mitigation system includes a MACs film removal sub-system (14) and a wafer surface sustaining sub-system (16) for sustaining or maintaining the cleaned surface (18A) of a wafer (18) in a substantially MACs-free condition for some predetermined period of time, such as the typical amount of time required after MACs film removal to perform a desired measurement on the wafer using a metrology tool (12). The MACs film removal sub-system can comprise a source (14A) of microwave energy that beneficially both heats and dissociates the chemical constituents of the MACs film. The wafer surface sustaining sub-system can be co-located with a measurement stage portion of the metrology tool, and preferably includes an atmosphere provided by a source (20) of clean gas.
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