发明申请
- 专利标题: Formation of conductive templates employing indium tin oxide
- 专利标题(中): 使用氧化铟锡形成导电模板
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申请号: US10706537申请日: 2003-11-12
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公开(公告)号: US20050098534A1公开(公告)日: 2005-05-12
- 发明人: Sidlgata Sreenivasan , Ian McMackin , Byung-Jin Choi , Ronald Voisin
- 申请人: Sidlgata Sreenivasan , Ian McMackin , Byung-Jin Choi , Ronald Voisin
- 申请人地址: US TX Austin
- 专利权人: MOLECULAR IMPRINTS, INC.
- 当前专利权人: MOLECULAR IMPRINTS, INC.
- 当前专利权人地址: US TX Austin
- 主分类号: C03C17/34
- IPC分类号: C03C17/34 ; G03F7/00 ; B44C1/22 ; C03C25/68 ; C23F1/00 ; G03C1/492
摘要:
The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.
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