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公开(公告)号：US20070026542A1
公开(公告)日：2007-02-01
申请号：US11470829
申请日：2006-09-07
IPC分类号： H01L21/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C03C17/3417 , C03C2217/77 , C03C2218/31 , C03C2218/328
摘要： The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.
摘要翻译： 本发明涉及一种形成导电模板的方法，其包括提供衬底; 在基板上形成台面; 以及在所述台面上形成多个凹陷和突出部，其中所述凹陷的最低点包括导电材料，并且所述突起包括电绝缘材料。 期望台面对于预定波长的辐射例如紫外线辐射基本上是透明的。 结果，期望由允许紫外线辐射传播的材料形成导电材料。 在本发明中，氧化铟锡是形成导电材料的合适材料。
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2.发明申请公开(公告)号：US20050074512A1
公开(公告)日：2005-04-07
申请号：US10898037
申请日：2004-07-23
申请人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
发明人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
IPC分类号： B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and first and second apertures, the first and second apertures disposed between the baffle and the template, with the first and second apertures in fluid communication with the fluid supply system to produce a turbulent flow of the fluid between the mold and said substrate.
摘要翻译： 本发明涉及一种用于在设置在模板上的模具和基板之间引入流体流的系统，该系统包括：流体供应系统; 以及具有挡板和第一和第二孔的卡盘体，所述第一和第二孔设置在挡板和模板之间，其中第一和第二孔与流体供应系统流体连通，以在流体供应系统之间产生紊流 模具和所述基板。
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公开(公告)号：US20060019183A1
公开(公告)日：2006-01-26
申请号：US10895214
申请日：2004-07-20
申请人： Ronald Voisin
发明人： Ronald Voisin
IPC分类号： G03F9/00 , G03C5/00 , G03F1/00 , B28B17/00 , B28B11/08 , A01J21/00 , B29B13/00 , B29C59/00 , A01J25/12
CPC分类号： G03F7/7035 , G03F7/70633 , Y10S977/887
摘要： An improved lithographic alignment method, system, and template. The method includes creating, within a lithographic subfield, subsequent-layer features which are intentionally offset from their respective previous-layer features, where the intentional offset may vary in magnitude and direction from one subfield to the next. The system includes an imprint lithographic machine and first and second lithography templates where the templates are adapted to enable the machine to form first and second features, respectively, and where a second feature is configured to be deliberately offset from a corresponding first feature. The template set includes at least two templates, one having features which are deliberately offset from corresponding features of another template. Also, a method of manufacturing such a template set.
摘要翻译： 改进的光刻对准方法，系统和模板。 该方法包括在光刻子场内创建有意从其各自的先前层特征偏移的后续层特征，其中有意偏移可以在一个子场到下一个子场的幅度和方向上变化。 该系统包括压印光刻机和第一和第二光刻模板，其中模板适于使得机器分别形成第一和第二特征，并且其中第二特征被配置为有意地偏离相应的第一特征。 模板集包括至少两个模板，一个具有故意偏离另一个模板的相应特征的特征。 另外，制造这样的模板集的方法。
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公开(公告)号：US20050098534A1
公开(公告)日：2005-05-12
申请号：US10706537
申请日：2003-11-12
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C03C17/3417 , C03C2217/77 , C03C2218/31 , C03C2218/328
摘要： The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.
摘要翻译： 本发明涉及一种形成导电模板的方法，其包括提供衬底; 在基板上形成台面; 以及在所述台面上形成多个凹陷和突出部，其中所述凹陷的最低点包括导电材料，并且所述突起包括电绝缘材料。 期望台面对于预定波长的辐射例如紫外线辐射基本上是透明的。 结果，期望由允许紫外线辐射传播的材料形成导电材料。 在本发明中，氧化铟锡是形成导电材料的合适材料。
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公开(公告)号：US20050084804A1
公开(公告)日：2005-04-21
申请号：US10687519
申请日：2003-10-16
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention pertains to disposing a diamond-like composition on a template, wherein the diamond-like composition acts as a release layer. The diamond-like composition is substantially transparent to actinic radiation, e.g., ultraviolet (UV) light, and will also have a desired surface energy, wherein the desired surface energy minimizes adhesion between the template and an underlying material disposed on a substrate. The diamond-like composition is characterized with a low surface energy that exhibits desirable release characteristics.
摘要翻译： 本发明涉及在模板上设置类金刚石组合物，其中类金刚石组合物用作剥离层。 类金刚石组合物对于光化辐射（例如紫外线（UV））光是基本上透明的，并且还将具有所需的表面能，其中期望的表面能使最小化模板和布置在基底上的下层材料之间的粘合性。 金刚石组合物的特征在于表现出所需释放特性的低表面能。
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公开(公告)号：US20050051698A1
公开(公告)日：2005-03-10
申请号：US10614716
申请日：2003-07-07
申请人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
发明人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
CPC分类号： B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.
摘要翻译： 本发明包括用于图案化液体配置在基板上的一致性模板。 模板包括具有相对的第一和第二表面的主体。 第一表面包括多个凹陷区域，其中图案化区域设置在相邻的凹陷区域之间。 具体地，凹陷区域限定挠曲区域，每个图案化区域围绕该弯曲区域可独立于模板的剩余图案形成区域移动。 在一个实施例中，模板安装到具有入口和通道的流体室。 模板连接到通道，并且入口连接到流体源以便于模板的变形以符合与其相邻的表面的轮廓。
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公开(公告)号：US20060176466A1
公开(公告)日：2006-08-10
申请号：US11389731
申请日：2006-03-27
申请人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
发明人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
IPC分类号： G03B27/58
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.
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公开(公告)号：US20060077374A1
公开(公告)日：2006-04-13
申请号：US11127060
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
发明人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
IPC分类号： G03B27/58
CPC分类号： B82Y10/00 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y40/00 , G03F7/0002 , H01L21/0271
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
摘要翻译： 描述的是通过压印光刻来图案化衬底的系统。 压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。 压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。 该系统包括施加激活光以固化活化光可固化液体的光源。
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公开(公告)号：US20070122942A1
公开(公告)日：2007-05-31
申请号：US11669569
申请日：2007-01-31
申请人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
发明人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
CPC分类号： B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.
摘要翻译： 本发明包括用于图案化液体配置在基板上的一致性模板。 模板包括具有相对的第一和第二表面的主体。 第一表面包括多个凹陷区域，其中图案化区域设置在相邻的凹陷区域之间。 具体地，凹陷区域限定挠曲区域，每个图案化区域围绕该弯曲区域可独立于模板的剩余图案形成区域移动。 在一个实施例中，模板安装到具有入口和通道的流体室。 模板连接到通道，并且入口连接到流体源以便于模板的变形以符合与其相邻的表面的轮廓。
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公开(公告)号：US20060076717A1
公开(公告)日：2006-04-13
申请号：US11127041
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
发明人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
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