发明申请
US20050106500A1 Nitrogen-containing organic compound, resist composition and patterning process
有权
含氮有机化合物，抗蚀剂组合物和图案化工艺
- 专利标题： Nitrogen-containing organic compound, resist composition and patterning process
- 专利标题（中）： 含氮有机化合物，抗蚀剂组合物和图案化工艺
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申请号： US10984933申请日： 2004-11-10
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公开(公告)号： US20050106500A1公开(公告)日： 2005-05-19
- 发明人: Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Katsuya Takemura , Kazumi Noda , Katsuhiro Kobayashi
- 申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Katsuya Takemura , Kazumi Noda , Katsuhiro Kobayashi
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 优先权： JP2003-384505 20031114
- 主分类号： G03C1/492
- IPC分类号： G03C1/492 ; G03F7/004 ; G03F7/038 ; G03F7/039
摘要：
Chemically amplified resist compositions comprising nitrogen-containing organic compounds having an aromatic carboxylic acid ester structure have an excellent resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.
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