发明申请
- 专利标题: Method of manufacturing ink jet recording head, ink jet recording head, and ink jet cartridge
- 专利标题(中): 制造喷墨记录头,喷墨记录头和喷墨墨盒的方法
-
申请号: US10990492申请日: 2004-11-18
-
公开(公告)号: US20050117005A1公开(公告)日: 2005-06-02
- 发明人: Kenji Fujii , Shuji Koyama , Masaki Osumi , Shingo Nagata , Jun Yamamuro , Yoshinori Tagawa , Hiroyuki Murayama , Yoshinobu Urayama
- 申请人: Kenji Fujii , Shuji Koyama , Masaki Osumi , Shingo Nagata , Jun Yamamuro , Yoshinori Tagawa , Hiroyuki Murayama , Yoshinobu Urayama
- 申请人地址: JP TOKYO
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP TOKYO
- 优先权: JP2003-399219 20031128; JP2004-319362 20041102
- 主分类号: B41J2/045
- IPC分类号: B41J2/045 ; B41J2/055 ; B41J2/16 ; B41J2/19
摘要:
A method of manufacturing an ink jet head which discharges ink, comprising: a step of preparing a silicon substrate; a step of forming a membrane having a layer in which a plurality of holes are disposed to constitute a filter mask, and a layer with which a first surface is coated in such a manner that the first surface is not exposed from the plurality of holes on the first surface of the substrate; a step of forming a close contact enhancing layer on the membrane formed on the substrate; a step of forming a channel constituting member on the close contact enhancing layer to constitute a plurality of discharge ports and a plurality of ink channels communicating with the plurality of discharge ports; a step of forming an ink supply port communicating with the plurality of ink channels in the silicon substrate by anisotropic etching from a second surface facing the first surface of the substrate; and a step of forming a filter in a portion of the close contact enhancing layer positioned in an opening of the ink supply port using the layer of the membrane in which a plurality of holes are disposed as the mask.
公开/授权文献
信息查询
IPC分类: