发明申请
- 专利标题： Resist pattern forming method, magnetic recording medium manufacturing method and magnetic head manufacturing method
- 专利标题（中）： 抗蚀剂图案形成方法，磁记录介质制造方法和磁头制造方法
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申请号： US10982824申请日： 2004-11-08
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公开(公告)号： US20050118817A1公开(公告)日： 2005-06-02
- 发明人: Minoru Fujita , Mitsuru Takai
- 申请人： Minoru Fujita , Mitsuru Takai
- 专利权人： TDK Corporation
- 当前专利权人： TDK Corporation
- 优先权： JPP2003-384694 20031114
- 主分类号： G03F7/40
- IPC分类号： G03F7/40 ; B05D3/10 ; G03F7/00 ; G11B5/31 ; G11B5/39 ; G11B5/74 ; G11B5/82 ; G11B5/84 ; G11B5/855 ; H01L21/027 ; H01L21/302 ; H01L21/461
摘要：
A mold having a pattern of a concavo-convex surface including protrusion and recess is prepared and the pattern is transferred to a resist layer formed on a substrate by an imprinting method. The side surface of a protrusion of the transferred resist pattern is then etched so that the protrusion has a width narrower than a width of the corresponding recess formed to the mold. This resist pattern forming method is preferably applicable to a magnetic recording medium manufacturing method and a magnetic head manufacturing method.
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