发明申请
- 专利标题: Processing system and exposure apparatus using the same
- 专利标题(中): 处理系统和使用其的曝光装置
-
申请号: US11001116申请日: 2004-12-02
-
公开(公告)号: US20050121144A1公开(公告)日: 2005-06-09
- 发明人: Ryo Edo , Masami Yonekawa , Shinichi Hara
- 申请人: Ryo Edo , Masami Yonekawa , Shinichi Hara
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2003-404023 20031203
- 主分类号: B08B7/00
- IPC分类号: B08B7/00 ; G03F7/20 ; H01L21/00 ; H01L21/027 ; H01L21/677 ; C23F1/00
摘要:
A processing system includes a supplying part for storing an object to be fed and for being maintained at an atmospheric pressure a processing chamber for being maintained at a reduced pressure or vacuum atmosphere and for executing a predetermined processing to the object, the object being fed between the supplying part and the processing chamber, a vacuum chamber, arranged between the supplying part and the processing chamber, for storing the object at a pressure of 100 Pa or less, the vacuum chamber having a replaceable atmosphere, and a first load lock chamber, arranged between the supplying part and said vacuum chamber, for receiving and supplying the object between the supplying part and said vacuum chamber, the first load lock chamber having a replaceable atmosphere.
公开/授权文献
信息查询