公开(公告)号：US20050121144A1

公开(公告)日：2005-06-09

申请号：US11001116

申请日：2004-12-02

申请人： Ryo Edo ,  Masami Yonekawa ,  Shinichi Hara

发明人： Ryo Edo ,  Masami Yonekawa ,  Shinichi Hara

IPC分类号： B08B7/00 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  C23F1/00

CPC分类号： H01L21/67173 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70916 ,  G03F7/70925 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67225 ,  Y10S134/902 ,  Y10S414/14

摘要： A processing system includes a supplying part for storing an object to be fed and for being maintained at an atmospheric pressure a processing chamber for being maintained at a reduced pressure or vacuum atmosphere and for executing a predetermined processing to the object, the object being fed between the supplying part and the processing chamber, a vacuum chamber, arranged between the supplying part and the processing chamber, for storing the object at a pressure of 100 Pa or less, the vacuum chamber having a replaceable atmosphere, and a first load lock chamber, arranged between the supplying part and said vacuum chamber, for receiving and supplying the object between the supplying part and said vacuum chamber, the first load lock chamber having a replaceable atmosphere.

摘要翻译： 一种处理系统，包括：供给部件，用于储存待进料的物体，并保持在大气压下的处理室，用于保持在减压或真空气氛中，并对所述物体执行预定的处理，所述物体在 供给部和处理室，设置在供给部和处理室之间的真空室，用于在100Pa以下的压力下存储物体，具有可更换气氛的真空室和第一负载锁定室， 布置在供应部分和所述真空室之间，用于在供应部分和所述真空室之间接收和供应物体，第一负载锁定室具有可更换的气氛。

公开(公告)号：US20060082743A1

公开(公告)日：2006-04-20

申请号：US11250072

申请日：2005-10-12

申请人： Masami Yonekawa ,  Shinichi Hara ,  Ryo Edo

发明人： Masami Yonekawa ,  Shinichi Hara ,  Ryo Edo

IPC分类号： G03B27/52

CPC分类号： G03F7/70925

摘要： At least one exemplary embodiment is directed to an apparatus which includes an original stage, to hold an original, which moves in a scan direction, an illumination optical system configured to illuminate the original held by the original stage with exposure light, a substrate stage configured to hold a substrate and to move in a scan direction, a projection optical system configured to project a pattern of the original onto the substrate with the exposure light, and an irradiation unit configured to irradiate the original held by the original stage. Irradiation by the irradiation unit and movement of the original stage in the scan direction are carried out substantially in parallel with each other so as to remove a contaminant on the original.

摘要翻译： 至少一个示例性实施例涉及一种装置，其包括原始台，用于保持沿扫描方向移动的原件，配置成用曝光灯照亮由原始台保持的原件的照明光学系统，衬底台配置 保持基板并沿扫描方向移动;投影光学系统，被配置为利用曝光光将原稿的图案投影到基板上;以及照射单元，被配置为照射由原始台保持的原稿。 通过照射单元的照射和原始台沿扫描方向的移动基本上彼此平行地进行，以便去除原件上的污染物。

公开(公告)号：US07670754B2

公开(公告)日：2010-03-02

申请号：US11001116

申请日：2004-12-02

申请人： Ryo Edo ,  Masami Yonekawa ,  Shinichi Hara

发明人： Ryo Edo ,  Masami Yonekawa ,  Shinichi Hara

IPC分类号： H01L21/00 ,  G03F7/00 ,  G03B27/42

CPC分类号： H01L21/67173 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70916 ,  G03F7/70925 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67225 ,  Y10S134/902 ,  Y10S414/14

摘要： An exposure apparatus for executing an exposure of a substrate to light via a mask. The apparatus includes a booth which stores the mask in an atmospheric pressure, a processing chamber in which the exposure is executed in a first vacuum pressure, a vacuum chamber, arranged between the booth and the processing chamber, stores the mask at a second vacuum pressure that is higher than the first vacuum pressure and is between 0.1 Pa and 100 Pa, a first load lock chamber, arranged between the booth and the vacuum chamber, through which the mask is transferred, in which the atmospheric pressure and the second vacuum pressure are replaceable, and a second load lock chamber arranged between the vacuum chamber and the processing chamber, through which the mask is transferred, in which the second vacuum pressure and the first vacuum pressure are replaceable.

摘要翻译： 一种曝光装置，用于通过掩模执行基板的曝光。 该装置包括将大气压下的面罩存放在展位，在第一真空压力下进行曝光的处理室，布置在展位和处理室之间的真空室，将面罩存储在第二真空压力 其高于第一真空压力并且在0.1Pa和100Pa之间，第一负载锁定室，布置在所述展位和所述真空室之间，所述掩模通过所述真空室转移，其中所述大气压力和所述第二真空压力为 以及布置在真空室和处理室之间的第二加载锁定室，通过该第二加载锁定腔传送掩模，其中第二真空压力和第一真空压力是可替换的。

公开(公告)号：US07319507B2

公开(公告)日：2008-01-15

申请号：US11250072

申请日：2005-10-12

申请人： Masami Yonekawa ,  Shinichi Hara ,  Ryo Edo

发明人： Masami Yonekawa ,  Shinichi Hara ,  Ryo Edo

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70925

摘要： At least one exemplary embodiment is directed to an apparatus which includes an original stage, to hold an original, which moves in a scan direction, an illumination optical system configured to illuminate the original held by the original stage with exposure light, a substrate stage configured to hold a substrate and to move in a scan direction, a projection optical system configured to project a pattern of the original onto the substrate with the exposure light, and an irradiation unit configured to irradiate the original held by the original stage. Irradiation by the irradiation unit and movement of the original stage in the scan direction are carried out substantially in parallel with each other so as to remove a contaminant on the original.

摘要翻译： 至少一个示例性实施例涉及一种装置，其包括原始台，用于保持沿扫描方向移动的原件，配置成用曝光灯照亮由原始台保持的原件的照明光学系统，衬底台配置 保持基板并沿扫描方向移动;投影光学系统，被配置为利用曝光光将原稿的图案投影到基板上;以及照射单元，被配置为照射由原始台保持的原稿。 通过照射单元的照射和原始台沿扫描方向的移动基本上彼此平行地进行，以便去除原件上的污染物。

公开(公告)号：US5225686A

公开(公告)日：1993-07-06

申请号：US757310

申请日：1991-09-10

申请人： Ryo Edo

发明人： Ryo Edo

IPC分类号： G03F9/00 ,  H01L21/027

CPC分类号： G03F9/70

摘要： An alignment detecting method in which alignment detection for a mask and a wafer is effected by using an alignment beam projected from an alignment unit. According to this method, the attitude of the alignment unit is detected and an angle of projection of the alignment beam is adjusted o the basis of the attitude detection. Then, alignment detection for the mask and t he wafer is effected by using the angle-adjusted alignment beam.

摘要翻译： 一种对准检测方法，其中通过使用从对准单元投影的对准光束来实现掩模和晶片的对准检测。 根据该方法，检测对准单元的姿势，并根据姿态检测来调整对准光束的投影角度。 然后，通过使用角度调整的对准光束来实现掩模和晶片的对准检测。

公开(公告)号：US5800949A

公开(公告)日：1998-09-01

申请号：US622004

申请日：1996-03-26

申请人： Ryo Edo ,  Ryuichi Ebinuma ,  Hiroshi Maehara

发明人： Ryo Edo ,  Ryuichi Ebinuma ,  Hiroshi Maehara

IPC分类号： G03F1/22 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/707 ,  G03F9/70

摘要： A mask includes a mask substrate on which a mask pattern is formed, a frame for supporting the mask substrate, and at least one alignment mark formed on the frame. The alignment mark is used for positioning the mask substrate on the frame. The invention also includes a method for making a mask comprising the steps of forming at least one alignment mark at a predetermined position on a mask frame, forming a mask pattern on a mask substrate at a predetermined position with respect to the alignment mark, and joining the mask substrate and the mask frame to form a mask. In addition, the method can include the step of joining the mask substrate and the frame in a predetermined positional relationship on the basis of the position of the alignment mark.

摘要翻译： 掩模包括其上形成掩模图案的掩模基板，用于支撑掩模基板的框架和形成在框架上的至少一个对准标记。 对准标记用于将掩模基板定位在框架上。 本发明还包括一种制造掩模的方法，包括以下步骤：在掩模框架上的预定位置处形成至少一个对准标记，在掩模基板上相对于对准标记在预定位置形成掩模图案，以及接合 掩模基板和掩模框架以形成掩模。 此外，该方法可以包括基于对准标记的位置以预定位置关系接合掩模基板和框架的步骤。

公开(公告)号：US07656507B2

公开(公告)日：2010-02-02

申请号：US11363955

申请日：2006-03-01

申请人： Ryo Edo

发明人： Ryo Edo

IPC分类号： G03B27/62

CPC分类号： G03F7/70741

摘要： A processing unit including a supply section for storing a mask having a patterned surface having a pattern to be exposed to a plate, the supply section being maintained under atmospheric pressure, a process chamber for processing the plate, the process chamber being maintained in a reduced pressure or vacuum atmosphere and the processing unit transferring the mask between the supply section and the process chamber, and a protection unit for protecting the patterned surface in a non-contact manner and for holding part of the mask other than the patterned surface. The protection unit covers the mask while opening at least a part of the other side surface of the patterned surface. The processing unit further includes a transfer unit for adsorbing the protection unit and for transferring the protection unit and the mask held by the protection unit, between the supply section and the process chamber.

摘要翻译： 一种处理单元，包括用于存储具有图案的掩模的供给部，所述图案表面具有暴露于板的图案，所述供应部保持在大气压下，处理室用于处理所述板，所述处理室保持在减小的状态 压力或真空气氛，并且处理单元在供给部和处理室之间传送掩模，以及用于以非接触方式保护图案化表面并用于保持除了图案化表面之外的部分掩模的保护单元。 保护单元在打开图案化表面的另一侧表面的至少一部分的同时覆盖掩模。 处理单元还包括用于吸附保护单元并用于传送保护单元和由保护单元保持的掩模在输送部分和处理室之间的转印单元。

公开(公告)号：US07236229B2

公开(公告)日：2007-06-26

申请号：US10794499

申请日：2004-03-05

申请人： Ryo Edo

发明人： Ryo Edo

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62 ,  G03B27/32

CPC分类号： H01L21/67748 ,  Y10S414/135 ,  Y10S414/138 ,  Y10S414/139

摘要： A load lock chamber provided between a port that accommodates an object to be processed and is maintained at an ambient pressure, and a process chamber that is maintained at a reduced pressure or vacuum environment and performs a predetermined process for the object, said load lock chamber replacing an atmosphere in said load lock chamber and delivering the object between the port and the process chamber includes a first load lock chamber that includes a first holder for holding the object received from the port, and a second load lock chamber that includes a second holder for holding the object received from the process chamber, wherein the first holder holds more objects than the second holder.

摘要翻译： 负载锁定室，设置在容纳待处理物体的端口和保持在环境压力之间，并且处理室保持在减压或真空环境中，并且对物体执行预定的处理，所述负载锁定室 替换所述装载锁定室中的气氛并且在所述端口和所述处理室之间输送物体包括第一负载锁定室，所述第一负载锁定室包括用于保持从所述端口接收的物体的第一保持器和包括第二保持器的第二负载锁定室 用于保持从处理室接收的物体，其中第一保持器保持比第二保持器更多的物体。

公开(公告)号：US20060197935A1

公开(公告)日：2006-09-07

申请号：US11363955

申请日：2006-03-01

申请人： Ryo Edo

发明人： Ryo Edo

IPC分类号： G03B27/62

CPC分类号： G03F7/70741

摘要： A processing unit includes a supply section for storing a mask having a pattern surface having a pattern to be exposed to a plate, the supply section being maintained under atmospheric pressure, a process chamber for processes the plate, the process chamber being maintained in a reduced pressure or vacuum atmosphere, said processing unit transferring the mask between the supply section and the process chamber, a protection unit for protecting the pattern surface in a non-contact manner and for holding part of the mask other than the pattern surface, and a transfer unit for adsorbing the protection unit and for transferring the protection unit and the mask held by the protection unit, between the supply section and the process chamber.

摘要翻译： 处理单元包括：供给部，用于存储具有图案的掩模，所述图案表面具有要暴露于板的图案，所述供应部保持在大气压下;处理室，用于处理所述板，所述处理室保持在减小的状态 压力或真空气氛，所述处理单元在供给部和处理室之间传送掩模，保护单元，用于以非接触方式保护图案表面并且用于保持除了图案表面之外的部分掩模，以及转印 用于吸收保护单元并用于传送保护单元和由保护单元保持的面罩在供应部分和处理室之间的单元。

公开(公告)号：US07276097B2

公开(公告)日：2007-10-02

申请号：US10809021

申请日：2004-03-24

申请人： Ryo Edo

发明人： Ryo Edo

IPC分类号： B05C5/00

CPC分类号： B01D53/265 ,  H01L21/67017

摘要： A load-lock system includes a load-lock chamber arranged between a storage port which stores a substrate and a process chamber which processes the substrate in a process space maintained at a pressure lower than that in the storage port, and a dehumidifying unit which forms a dehumidified environment in the load-lock chamber. A system preferably includes another chamber between said storage port and said load-lock chamber, wherein said dehumidifying unit dehumidifies said another chamber.

摘要翻译： 一种装载锁定系统，包括一个装载锁定室，它设置在一个储存一个基板的存储口和一个处理室之间，该处理室在保持在低于储存口的压力的过程空间内处理该基板;以及一个除湿单元， 加载锁定室中的除湿环境。 系统优选地包括在所述存储端口和所述装载锁定室之间的另一室，其中所述除湿单元除湿所述另一个室。