Invention Application
US20050123459A1 Method of purifying niobium compound and/or tantalum compound
审中-公开
铌化合物和/或钽化合物的净化方法
- Patent Title: Method of purifying niobium compound and/or tantalum compound
- Patent Title (中): 铌化合物和/或钽化合物的净化方法
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Application No.: US10505806Application Date: 2003-02-27
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Publication No.: US20050123459A1Publication Date: 2005-06-09
- Inventor: Hirohisa Kikuyama , Masahide Waki , Hiroto Izumi , Hirofumi Yazaki , Kenji Aoki , Shinji Hashiguchi , Masatsugu Kawawaki , Yuko Murakami
- Applicant: Hirohisa Kikuyama , Masahide Waki , Hiroto Izumi , Hirofumi Yazaki , Kenji Aoki , Shinji Hashiguchi , Masatsugu Kawawaki , Yuko Murakami
- Priority: JP2002-52411 20020227
- International Application: PCT/JP03/02224 WO 20030227
- Main IPC: C01G33/00
- IPC: C01G33/00 ; C01G35/00 ; C01G35/02 ; C22B3/44 ; C22B34/20 ; C22B34/24
Abstract:
The present invention provides a method for purifying a niobium compound and/or tantalum compound in a simplified manner at a low cost. This is accomplished by providing a method for purifying a niobium compound and/or tantalum compound whereby a niobium compound and/or tantalum compound dissolved in a solvent is allowed to precipitate to be isolated.
Information query
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