发明申请
- 专利标题： Patterning method
- 专利标题（中）： 图案化方法
-
申请号： US10485419申请日： 2003-05-28
-
公开(公告)号： US20050124092A1公开(公告)日： 2005-06-09
- 发明人: Gian-Luca Bona , Bruno Michel , Hugo Rothuizen , Peter Vettiger , Han Biebuyck
- 申请人： Gian-Luca Bona , Bruno Michel , Hugo Rothuizen , Peter Vettiger , Han Biebuyck
- 优先权： EP02405431.4 20020530
- 国际申请： PCT/IB03/02278 WO 20030528
- 主分类号： G02B5/18
- IPC分类号： G02B5/18 ; G03F7/00 ; G03F9/00 ; H01L21/48
摘要：
The invention relates to a method for creating a pattern on a substrate comprising a first alignment structure, using an elastomeric stamp comprising a patterning structure and a second alignment structure. The method comprises a moving step for moving the elastomeric stamp towards the substrate, and a deformation step for deforming the patterning structure with a tensile or compressive force generated by cooperation of the first alignment structure and the second alignment structure.
公开/授权文献
- US07235464B2 Patterning method 公开/授权日：2007-06-26
信息查询
