发明申请
- 专利标题： Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
- 专利标题（中）： 用于有机抗反射涂层的光吸收剂聚合物，其制备方法和包含其的有机抗反射涂料组合物
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申请号： US10962867申请日： 2004-10-12
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公开(公告)号： US20050130061A1公开(公告)日： 2005-06-16
- 发明人: Jae-Chang Jung , Keun Kong , Seok-kyun Kim
- 申请人： Jae-Chang Jung , Keun Kong , Seok-kyun Kim
- 申请人地址： JP Kyungki-Do
- 专利权人： HYNIX SEMICONDUCTOR INC.
- 当前专利权人： HYNIX SEMICONDUCTOR INC.
- 当前专利权人地址： JP Kyungki-Do
- 优先权： KR2003-71914 20031015
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; C08F232/08 ; G03F7/09 ; B05D5/06 ; C08F116/34 ; G03C1/492
摘要：
Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused reflection of lower film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
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