发明申请
- 专利标题： Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method
- 专利标题（中）： 用于检测光学部件的辐射通量和污染的组件，包括这种组件的光刻设备和器件制造方法
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申请号： US10740829申请日： 2003-12-22
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公开(公告)号： US20050133727A1公开(公告)日： 2005-06-23
- 发明人: Vadim Banine , Levinus Bakker , Johannes Hubertus Moors , Lucas Henricus Johannes Stevens , Yurii Sidelnikov , Marcel Mathijs Dierichs , Marius Ravensbergen
- 申请人： Vadim Banine , Levinus Bakker , Johannes Hubertus Moors , Lucas Henricus Johannes Stevens , Yurii Sidelnikov , Marcel Mathijs Dierichs , Marius Ravensbergen
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01J3/14
摘要：
An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.
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