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公开(公告)号：US20060072088A1
公开(公告)日：2006-04-06
申请号：US10957751
申请日：2004-10-05
申请人： Matthew Lipson , Marcel Mathijs Dierichs , Sjoerd Nicolaas Donders , Johannes Catharinus Mulkens , Bob Streefkerk , Ronald Wilklow , Roel De Jonge
发明人： Matthew Lipson , Marcel Mathijs Dierichs , Sjoerd Nicolaas Donders , Johannes Catharinus Mulkens , Bob Streefkerk , Ronald Wilklow , Roel De Jonge
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
摘要翻译： 提供了一种光刻设备，其中通过突出通过碱金属卤化物的水溶液进行曝光，该溶液与待暴露的基板接触。
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公开(公告)号：US20050221238A1
公开(公告)日：2005-10-06
申请号：US10816169
申请日：2004-04-02
IPC分类号： G03F7/20
摘要： A lithographic apparatus comprising a patterning reticle which has an aluminium absorber layer which improves imaging by eliminating or at least minimising the formation of aberrations in a patterned beam.
摘要翻译： 一种光刻设备，其包括图案化掩模版，其具有铝吸收层，其通过消除或至少最小化图案化束中的像差的形成来改善成像。
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公开(公告)号：US20050024609A1
公开(公告)日：2005-02-03
申请号：US10860662
申请日：2004-06-04
申请人： Joannes De Smit , Vadim Banine , Theodorus Josephus Bisschops , Marcel Mathijs Dierichs , Theodorus Modderman
发明人： Joannes De Smit , Vadim Banine , Theodorus Josephus Bisschops , Marcel Mathijs Dierichs , Theodorus Modderman
IPC分类号： G03F7/20 , H01L21/027 , G03B27/00 , G03F7/00
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。
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4.发明申请Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method 失效用于检测光学部件的辐射通量和污染的组件，包括这种组件的光刻设备和器件制造方法公开(公告)号：US20050133727A1
公开(公告)日：2005-06-23
申请号：US10740829
申请日：2003-12-22
申请人： Vadim Banine , Levinus Bakker , Johannes Hubertus Moors , Lucas Henricus Johannes Stevens , Yurii Sidelnikov , Marcel Mathijs Dierichs , Marius Ravensbergen
发明人： Vadim Banine , Levinus Bakker , Johannes Hubertus Moors , Lucas Henricus Johannes Stevens , Yurii Sidelnikov , Marcel Mathijs Dierichs , Marius Ravensbergen
CPC分类号： G03F7/70916 , G03F7/7085
摘要： An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.
摘要翻译： 用于检测光学部件上的辐射通量和污染物中的至少一种的组件包括被配置为接收辐射通量和污染物中的至少一种的检测器，并且当使用该组件时，生成与至少相关的检测器信号 辐射通量和部件污染之一。 仪表被配置为测量检测器信号。 检测器包括至少一根线。
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公开(公告)号：US20060119824A1
公开(公告)日：2006-06-08
申请号：US11001189
申请日：2004-12-02
IPC分类号： G03B27/54
CPC分类号： G03F7/70033 , G03F7/7005 , G03F7/70175 , G03F7/70208
摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned radiation onto a target portion of the substrate. The illumination system includes a plurality of radiation sources; a pupil facet mirror; and a plurality of field facet mirrors, each field facet mirror being associated with one of the radiation sources and each field facet of a given field facet mirror being configured to image the associated source onto one of a plurality of pupil facets on the pupil facet mirror, each pupil facet being adapted to direct the source image received to a predetermined area to form the beam of radiation. To improve image quality, the path length between each field facet and its associated pupil facet is substantially the same for each field/pupil facet pair and the pupil facets have a plurality of different sizes, the size of each depending on a characteristic of the source by which it is illuminated. The radiation sources may emit radiation in the EUV wavelength range.
摘要翻译： 光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持基板的基板台，以及配置成将图案化的辐射投影到基板的目标部分上的投影系统。 照明系统包括多个辐射源; 瞳孔面镜; 和多个场分面反射镜，每个场分面反射镜与辐射源中的一个相关联，并且给定场分面反射镜的每个场分面被配置成将相关的源成像到瞳孔面反射镜上的多个光瞳面之一 ，每个瞳孔面适于将接收的源图像引导到预定区域以形成辐射束。 为了提高图像质量，每个场分面与其相关联的光瞳小面之间的路径长度对于每个场/光瞳小面对基本相同，并且瞳孔面具有多个不同的尺寸，每个视场的尺寸取决于源的特性 照亮它。 辐射源可以发射EUV波长范围的辐射。
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公开(公告)号：US20070115449A1
公开(公告)日：2007-05-24
申请号：US11636586
申请日：2006-12-11
IPC分类号： G03B27/80
CPC分类号： G03F7/70075 , G03F7/70091 , G03F7/70108 , G03F7/70191 , G03F7/702
摘要： A lithographic apparatus includes a device having a blade selectively insertable into the beam. The device is in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system. The blade may include a partially opaque blade and a solid blade or have a predetermined transmissibility pattern. The transmissibility may vary in a second direction perpendicular to the first direction in which the substrate and the patterning device are movable. In an illumination system including a field faceted mirror and a pupil faceted mirror, a reflecting blade is selectively insertable into the beam to reflect a portion of the beam to a beam dump that may be cooled to reduce a heat load. The reflecting element may have a coating that scatters the portion of radiation or changes the phase.
摘要翻译： 光刻设备包括具有可选择性地插入光束中的刀片的装置。 该装置处于第一平面中间，与第二平面共轭于基板平面，第三平面与投影系统的光瞳平面共轭。 刀片可以包括部分不透明的刀片和固体刀片，或者具有预定的传递性图案。 透射率可以在垂直于衬底和图案形成装置可移动的第一方向的第二方向上变化。 在包括场分面镜和瞳孔刻面镜的照明系统中，反射片可选择性地插入光束中，以将光束的一部分反射到可以被冷却以减少热负荷的光束倾倒。 反射元件可以具有散射辐射部分或改变相位的涂层。
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公开(公告)号：US20070103655A1
公开(公告)日：2007-05-10
申请号：US11642912
申请日：2006-12-21
IPC分类号： G03B27/32
CPC分类号： G03F7/70958 , G03F7/70341
摘要： A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.
摘要翻译： 基板设置有对投影光束的波长基本透明的材料涂层。 涂层可以比投影光束的波长厚，并且具有涂层的折射率，使得投影光束的波长在其通过时被缩短。 这允许在衬底上成像较小的特征。 或者，涂层可以与液体供应系统一起使用，并且用于保持气泡远离基底的辐射敏感层。
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公开(公告)号：US20050175940A1
公开(公告)日：2005-08-11
申请号：US10775326
申请日：2004-02-11
CPC分类号： G03F7/70341 , G03F7/70958 , Y10S430/162
摘要： A method of reducing the effect of bubbles on the imaging quality of an immersion lithography apparatus, in which a top coating is applied to a substrate to keep bubbles away from a radiation sensitive layer of the substrate.
摘要翻译： 一种降低气泡对浸没式光刻设备的成像质量的影响的方法，其中将顶涂层施加到基底以将气泡远离基底的辐射敏感层。
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公开(公告)号：US20050146702A1
公开(公告)日：2005-07-07
申请号：US10976314
申请日：2004-10-29
申请人： Markus Eurlings , Johannes Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Dierichs , Antonius Johannes Dijsseldonk , Judocus Stoeldraijer
发明人： Markus Eurlings , Johannes Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Dierichs , Antonius Johannes Dijsseldonk , Judocus Stoeldraijer
IPC分类号： G03B27/54 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70075
摘要： The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.
摘要翻译： 本发明提供了一种包括用于提供投影射线束的照明系统的光刻设备。 照明系统包括至少一个可移动光学元件（7），使得投影射线束（4）能够围绕中心位置移动。 这确保了投影束（4）中的强度分布中的不均匀性将被涂抹，这反过来提供了由诸如晶片或其它基底的系统照射的表面的曝光的改进的均匀性。 光学元件（7）可以包括电动机可移动镜，棱镜，滤镜，透镜，旋转三棱镜，漫射器，衍射光学阵列，光学积分器等。本发明还提供了一种使用根据本发明的光刻设备的器件制造方法， 其中所述光学元件被移动，以便为所述投影射束提供最佳均匀性。
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公开(公告)号：US20070046915A1
公开(公告)日：2007-03-01
申请号：US11355192
申请日：2006-02-16
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70866 , G03F7/70958
摘要： A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.
摘要翻译： 提供了一种光刻设备和设备的制造方法，其中通过突发通过pH小于7的液体进行曝光，液体与待暴露的基板接触。 液体有利地包括抗反射面漆。
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