发明申请
- 专利标题： Device manufacturing method and mask for use therein
- 专利标题（中）： 装置制造方法及其使用面罩
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申请号： US10736779申请日： 2003-12-17
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公开(公告)号： US20050136334A1公开(公告)日： 2005-06-23
- 发明人: Marcel Mathijs Theodore Dierichs , Markus Franciscus Eurlings , Donis Flagello
- 申请人： Marcel Mathijs Theodore Dierichs , Markus Franciscus Eurlings , Donis Flagello
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F1/08
- IPC分类号： G03F1/08 ; G03F7/00 ; G03F7/20 ; G03F9/00 ; H01L21/027
摘要：
A device manufacturing method, is presented herein. In one embodiment, the device manufacturing method includes a mask for use with DUV having a quartz substrate and chrome absorber. The chrome absorber has a thickness of about 700 nm which causes increased TE polarization in the transmitted light and improves contrast at the substrate level.
公开/授权文献
- US08252487B2 Device manufacturing method and mask for use therein 公开/授权日：2012-08-28
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