Invention Application
US20050147142A1 Surface-emitting type semiconductor laser and method of manufacturing the same
审中-公开
表面发射型半导体激光器及其制造方法
- Patent Title: Surface-emitting type semiconductor laser and method of manufacturing the same
- Patent Title (中): 表面发射型半导体激光器及其制造方法
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Application No.: US10980329Application Date: 2004-11-04
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Publication No.: US20050147142A1Publication Date: 2005-07-07
- Inventor: Satoshi Kito , Tsuyoshi Kaneko , Tsugio Ide
- Applicant: Satoshi Kito , Tsuyoshi Kaneko , Tsugio Ide
- Applicant Address: JP Tokyo
- Assignee: SEIKO EPSON CORPORATION
- Current Assignee: SEIKO EPSON CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2003-388047 20031118
- Main IPC: H01S5/183
- IPC: H01S5/183 ; H01S3/08 ; H01S5/00 ; H01S5/026 ; H01S5/10

Abstract:
A method is provided to provide surface-emitting type semiconductor lasers and methods for manufacturing the same, which can readily control transverse modes of laser light. A surface-emitting type semiconductor laser pertains to a surface-emitting type semiconductor laser having a vertical resonator above a substrate. The vertical resonator includes a first mirror, an active layer and a second mirror disposed in this order from the substrate, and is equipped with an optical path adjusting layer having a concave curved surface over the second mirror.
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