发明申请
- 专利标题: Interlocking lid for wet bench
- 专利标题(中): 湿板连接盖
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申请号: US10761628申请日: 2004-01-20
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公开(公告)号: US20050155976A1公开(公告)日: 2005-07-21
- 发明人: Yuen-Sheng Hua , Chi-Shen Yang , Yuan-Bang Lee , Ming-Zhe Chiang
- 申请人: Yuen-Sheng Hua , Chi-Shen Yang , Yuan-Bang Lee , Ming-Zhe Chiang
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 主分类号: B65D51/04
- IPC分类号: B65D51/04 ; B65D85/30 ; H01L21/00
摘要:
An interlocking lid which is suitable for a wet bench tank used in the processing of semiconductor wafer substrates. The interlocking lid includes a pair of lid panels typically provided with a clasp having elements for engaging and interlocking with each other when the lid panels are in a closed position. At least one of the lids may further include a beveled lid shoulder which facilitates runoff of liquids from and hinders pooling of liquids on the exterior surface of the lid.
公开/授权文献
- US07140512B2 Interlocking lid for wet bench 公开/授权日:2006-11-28
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