发明申请
摘要：
In one embodiment, a photoactive compound may be attached to a polymer backbone. This embodiment may be more resistant to the generation of reactive outgassing components and may exhibit better contrast.
公开/授权文献
- US07005227B2 One component EUV photoresist 公开/授权日：2006-02-28
信息查询
IPC分类:
