公开(公告)号：US09857687B2

公开(公告)日：2018-01-02

申请号：US14770979

申请日：2014-02-26

申请人： TOKAI SHINEI ELECTRONICS INDUSTRY CO., LTD ,  Tadayoshi Saito ,  YAMATOYA & CO., LTD

发明人： Kazunori Tsuge ,  Yoshihito Tanaka ,  Koji Akiyama ,  Kiyoshi Tanaka ,  Kazuyoshi Nishio ,  Takehiro Kato ,  Masaru Murakami ,  Tadayoshi Saito ,  Hirotoshi Yoshimura ,  Akira Inoue ,  Iwao Numakura ,  Noriaki Tsukada

IPC分类号： G03F7/004 ,  G03F7/09 ,  G03C1/76 ,  G03C1/95 ,  G03F7/20 ,  G03F7/11 ,  H01L23/498 ,  H05K1/02 ,  H05K3/28 ,  G03F1/50 ,  G03F7/32 ,  G03F7/40 ,  H05K3/34

CPC分类号： G03F7/2002 ,  G03C1/76 ,  G03C1/95 ,  G03F1/50 ,  G03F7/0012 ,  G03F7/004 ,  G03F7/038 ,  G03F7/09 ,  G03F7/11 ,  G03F7/2016 ,  G03F7/2022 ,  G03F7/203 ,  G03F7/32 ,  G03F7/40 ,  H01L23/49894 ,  H01L2924/0002 ,  H05K1/0269 ,  H05K3/287 ,  H05K3/341 ,  H05K2201/099 ,  H05K2201/09936 ,  H05K2203/056 ,  H05K2203/0571 ,  H01L2924/00

摘要： A method of manufacturing a substrate includes applying solder resist ink containing a mixing resin of epoxy-based resin and acrylic-based resin on at least one surface of a substrate body to form a solder resist layer, and irradiating a predetermined portion of the solder resist layer with ultraviolet rays and controlling an amount of irradiation of the ultraviolet rays irradiated to the predetermined of the solder resist layer to form the predetermined portion in transmissivity that transmits light.

公开(公告)号：US09731535B2

公开(公告)日：2017-08-15

申请号：US14354577

申请日：2011-10-27

申请人： Xulong Fu ,  Dheya M. Alfekri ,  Ronald J. Selensky

发明人： Xulong Fu ,  Dheya M. Alfekri ,  Ronald J. Selensky

IPC分类号： B41M5/00 ,  B41M5/50 ,  B32B27/10 ,  G03C1/76 ,  G03C1/81 ,  G03C1/93 ,  B41M7/00

CPC分类号： B41M5/506 ,  B32B27/10 ,  B41M5/504 ,  B41M5/508 ,  B41M7/0027 ,  B41M2205/38 ,  G03C1/7614 ,  G03C1/81 ,  G03C1/93 ,  Y10T428/24802

摘要： A high gloss photo media that has a gloss at 20 degrees equal to or greater than 40% includes a photo media substrate that includes a gloss-enhancement film on a front side of a photo base material. A curl control material is on a back side of the photo base material opposite the front side. The gloss-enhancement film being a multilayer that includes an adherent layer and a layer of one of a polyester composition and a polypropylene composition. A thickness of the gloss-enhancement film is at least 20 microns. The high gloss photo media further includes an image receiving layer on the gloss-enhancement film.

公开(公告)号：US09158191B2

公开(公告)日：2015-10-13

申请号：US13705387

申请日：2012-12-05

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Katsuya Takemura ,  Takeru Watanabe ,  Takashi Miyazaki

IPC分类号： G03F7/038 ,  G03C1/805 ,  B32B3/26 ,  G03F7/20 ,  G03F7/40 ,  G03F7/11 ,  G03F7/38 ,  G03F7/004 ,  G03F7/075 ,  G03C1/76

CPC分类号： G03C1/805 ,  B32B3/266 ,  G03C2001/7635 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0757 ,  G03F7/11 ,  G03F7/20 ,  G03F7/38 ,  G03F7/40 ,  Y10T428/24331 ,  Y10T428/24612

摘要： A chemically amplified negative resist composition is provided comprising (A) a resin having a crosslinking group, (B) a crosslinker, (C) a photoacid generator capable of generating an acid upon exposure to light of wavelength 190-500 nm, (D) a solvent, and (E) a fluoroalkyl-containing amine compound. The resist composition can form a fine pattern, specifically a fine hole or space pattern which has a positive taper (or forward taper) profile in which the size of top is greater than the size of bottom or improves the overhang profile with extremely projected top.

摘要翻译： （A）具有交联基团的树脂，（B）交联剂，（C）能够在暴露于波长190-500nm的光下产生酸的光酸产生剂，（D） 溶剂和（E）含氟烷基的胺化合物。 抗蚀剂组合物可以形成精细图案，特别是具有正锥度（或向前锥形）轮廓的细孔或空间图案，其中顶部的尺寸大于底部的尺寸，或者改善具有极高的顶部的悬垂型材。

公开(公告)号：US09079446B2

公开(公告)日：2015-07-14

申请号：US13879734

申请日：2010-10-29

申请人： Lokendra Pal ,  Xulong Fu ,  Christine E. Steichen

发明人： Lokendra Pal ,  Xulong Fu ,  Christine E. Steichen

IPC分类号： B41M5/00 ,  B41M5/50 ,  B41M5/52 ,  B41M7/00 ,  G03C1/76

CPC分类号： B41M5/502 ,  B41M5/504 ,  B41M5/506 ,  B41M5/508 ,  B41M5/5218 ,  B41M5/5254 ,  B41M7/0027 ,  G03C1/7614 ,  G03G7/0006 ,  G03G7/0053 ,  G03G7/0086 ,  G03G8/00

摘要： A photo media may comprise a substrate, the substrate having an image receiving side and a non-image receiving side, an extruded barrier layer disposed on the non-image receiving side of the substrate, and a laminate layer disposed on the image receiving side of the substrate after an ink layer is printed. The photo media may further comprise an image receiving layer disposed on the image receiving side of the substrate between the substrate and the laminate layer.

摘要翻译： 照片介质可以包括基板，具有图像接收侧和非图像接收侧的基板，设置在基板的非图像接收侧的挤出阻挡层和设置在基板的图像接收侧上的层叠层 印刷油墨层后的基材。 照片介质还可以包括设置在基板和层叠层之间的基板的图像接收侧上的图像接收层。

公开(公告)号：US08808963B2

公开(公告)日：2014-08-19

申请号：US13050522

申请日：2011-03-17

申请人： Hi-Kuk Lee ,  Sang-Hyun Yun ,  Min-Soo Lee ,  Deok-Man Kang ,  Sae-Tae Oh ,  Jae-Young Choi

发明人： Hi-Kuk Lee ,  Sang-Hyun Yun ,  Min-Soo Lee ,  Deok-Man Kang ,  Sae-Tae Oh ,  Jae-Young Choi

IPC分类号： G03C1/76

CPC分类号： H01L27/1288 ,  G03F7/0233 ,  H01L27/1214

摘要： A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.

摘要翻译： 光致抗蚀剂组合物包括粘合剂树脂，光酸产生剂，具有四种不同类型的单体的丙烯酸树脂和溶剂。

公开(公告)号：US08329784B2

公开(公告)日：2012-12-11

申请号：US13018207

申请日：2011-01-31

申请人： Dirk Quintens ,  Luc Leenders

发明人： Dirk Quintens ,  Luc Leenders

IPC分类号： C08L67/02 ,  C08J9/32 ,  B29C49/08 ,  B32B3/26 ,  B32B27/36 ,  G03C1/76

CPC分类号： G03C1/7954 ,  B29C55/06 ,  B29C55/143 ,  B29K2033/18 ,  B29K2067/00 ,  B29K2105/0032 ,  B29K2105/0088 ,  B29K2105/04 ,  B29K2711/12 ,  B29K2995/0025 ,  B41M5/36 ,  B41M5/41 ,  B41M5/508 ,  B41M2205/02 ,  B41M2205/12 ,  C08J5/18 ,  C08J2367/02 ,  C08K3/013 ,  C08L25/12 ,  C08L67/02 ,  Y10S430/165 ,  Y10T156/10 ,  Y10T428/24802 ,  Y10T428/24893 ,  Y10T428/249953 ,  Y10T428/249978 ,  Y10T428/249992 ,  Y10T428/254 ,  Y10T428/31786 ,  Y10T428/31855 ,  C08L2666/06 ,  C08L35/00 ,  C08L25/00

摘要： Disclosed is a process for preparing a non-transparent microvoided axially stretched film including i) mixing a linear polyester having monomer components consisting essentially of an aromatic dicarboxylic acid, an aliphatic diol and optionally an aliphatic dicarboxylic acid, a non-crosslinked random SAN-polymer and one or more additional ingredients to produce a mixture, ii) forming the mixture produced in step i) in a thick film followed by quenching; iii) stretching the thick film at a temperature between the glass transition temperature of the SAN-polymer and the glass transition temperature of said linear polyester to at least twice the initial length, and (iv) further stretching the film at an angle substantially 90° to the previous stretching process to at least twice the initial length and at 90° C. or below.

摘要翻译： 公开了一种制备不透明微孔轴向拉伸膜的方法，包括：i）将具有基本上由芳族二羧酸，脂族二醇和任选的脂族二羧酸组成的单体组分的线性聚酯，非交联的无规SAN聚合物 和一种或多种另外的成分以产生混合物，ii）在厚膜中形成步骤i）中制备的混合物，随后淬火; iii）在SAN聚合物的玻璃化转变温度和所述线性聚酯的玻璃化转变温度之间的温度下将厚膜拉伸至初始长度的至少两倍，和（iv）以大致90°的角度进一步拉伸该膜 至先前的拉伸过程至少为初始长度的两倍，并且在90℃或更低。

公开(公告)号：US07901868B2

公开(公告)日：2011-03-08

申请号：US12128171

申请日：2008-05-28

申请人： Robert David Allen ,  Rutnam Sooriyakumaran ,  Linda Karin Sundberg

发明人： Robert David Allen ,  Rutnam Sooriyakumaran ,  Linda Karin Sundberg

IPC分类号： G03F7/09 ,  G03F7/11 ,  G03C1/76 ,  C08G77/38

CPC分类号： C08G77/04 ,  C08G77/045 ,  G03F7/0752 ,  G03F7/11 ,  G03F7/2041

摘要： A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.

摘要翻译： 提供了式TmR3的官能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12，QnMnR1，R2，R3其中n等于8,10或12的组合物。 官能团包括碱水溶性部分。 官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。

公开(公告)号：US07771915B2

公开(公告)日：2010-08-10

申请号：US10874344

申请日：2004-06-24

申请人： Masaharu Akiba ,  Takeharu Tani ,  Hiroo Takizawa ,  Yoshio Inagaki

发明人： Masaharu Akiba ,  Takeharu Tani ,  Hiroo Takizawa ,  Yoshio Inagaki

IPC分类号： G03C1/76

CPC分类号： G11B7/246 ,  B82Y10/00 ,  G11B7/245 ,  G11B7/2463 ,  G11B7/2472 ,  G11B7/2475 ,  G11B7/2478 ,  G11B7/248 ,  G11B7/2492 ,  G11B7/2495 ,  G11B7/2531 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/2535 ,  G11B2007/24612

摘要： A two-photon absorbing optical recording material comprising at least one two-photon absorbing compound and a recording component is provided. Recording is made on it by utilizing the two-photon absorption of the two-photon absorbing compound in the material, and then the material is irradiated with light to thereby detect the difference in the reflectance between the recorded area and the unrecorded area thereof, and the recorded information is thereby reproduced from the material, and also provided are a photosensitive polymer composition and a photon-mode recording method for the material.

摘要翻译： 提供了包含至少一个双光子吸收化合物和记录组分的双光子吸收光学记录材料。 通过利用材料中的双光子吸收化合物的双光子吸收进行记录，然后用光照射材料，从而检测记录区域与未记录区域之间的反射率差异， 所记录的信息因此从材料中再现，并且还提供了用于该材料的光敏聚合物组合物和光子模式记录方法。

公开(公告)号：US07666572B2

公开(公告)日：2010-02-23

申请号：US11808543

申请日：2007-06-11

申请人： Yuji Harada ,  Jun Hatakeyama

发明人： Yuji Harada ,  Jun Hatakeyama

IPC分类号： G03F7/09 ,  G03F7/20 ,  G03F7/30 ,  G03C1/76

CPC分类号： G03F7/11 ,  C08F2/38 ,  C08F20/18 ,  C08F220/18 ,  C08F220/22 ,  C08F220/28 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/108

摘要： There is disclosed a resist top coat composition, comprising at least a polymer that has an amino group or a sulfonamide group at a polymer end and that is represented by the following general formula (1); and a patterning process comprising: at least, a step of forming a photoresist film on a substrate; a step of forming a resist top coat on the photoresist film by using the resist top coat composition; a step of exposing the substrate; and a step of developing the substrate with a developer. There can be provided a resist top coat composition that makes it possible to provide more certainly rectangular and excellent resist patterns when a top coat is formed on a photoresist film; and a patterning process using such a composition.

摘要翻译： 公开了一种抗蚀剂面漆组合物，其至少包含在聚合物末端具有氨基或磺酰胺基团并由以下通式（1）表示的聚合物; 以及图案化工艺，包括：至少在衬底上形成光致抗蚀剂膜的步骤; 通过使用抗蚀剂面漆组合物在光致抗蚀剂膜上形成抗蚀剂面涂层的步骤; 使基板曝光的工序; 以及用显影剂显影衬底的步骤。 可以提供抗蚀剂面漆组合物，当在光致抗蚀剂膜上形成顶涂层时，可以提供更确定的矩形和优异的抗蚀剂图案; 以及使用这种组合物的图案化工艺。

公开(公告)号：US07645499B2

公开(公告)日：2010-01-12

申请号：US10530426

申请日：2003-10-09

申请人： Haruhiko Habuta ,  Ken'ichi Nagata ,  Yoshitaka Sakaue ,  Hideo Kusada

发明人： Haruhiko Habuta ,  Ken'ichi Nagata ,  Yoshitaka Sakaue ,  Hideo Kusada

IPC分类号： B32B3/02 ,  G11B7/243 ,  G03C1/76

CPC分类号： G11B7/266 ,  G11B7/006 ,  G11B7/24038 ,  G11B7/252 ,  G11B7/2531 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/259 ,  G11B7/268 ,  G11B2007/24312 ,  G11B2007/24314 ,  G11B2007/24316 ,  G11B2007/25706 ,  G11B2007/25708 ,  G11B2007/2571 ,  G11B2007/25711 ,  G11B2007/25713 ,  G11B2007/25715 ,  G11B2007/25716

摘要： The optical information recording medium of the present invention includes a plurality of information layers provided on a substrate and an optical separating layer provided between information layer adjacent to each other, and information is recorded or reproduced by irradiation of a laser beam. When an information layer that is provided closest to a laser beam incident side of the plurality of information layers is taken as a first information layer and an optical separating layer provided in contact with the first information layer is taken as a first optical separating layer, then the first information layer comprises a recording layer, a transmittance adjusting layer that adjusts a transmittance of the first information layer, and a low refractive index layer provided between the transmittance adjusting layer and the first optical separating layer.

摘要翻译： 本发明的光信息记录介质包括设置在基板上的多个信息层和设置在彼此相邻的信息层之间的光分离层，并且通过激光束的照射来记录或再现信息。 将最靠近多个信息层的激光束入射侧的信息层作为第一信息层，将与第一信息层接触设置的光分离层作为第一光分离层， 第一信息层包括记录层，调节第一信息层的透射率的透射率调节层和设置在透射率调节层和第一光学分离层之间的低折射率层。