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发明申请
US20050158651A1 Adhesive compound and method for forming photoresist pattern using the same 失效
粘合剂和使用其形成光刻胶图案的方法

Adhesive compound and method for forming photoresist pattern using the same
摘要：
An adhesive compound for use during the formation of a photoresist film represented by the following chemical formula, wherein R represents a photoacid generator is disclosed.
摘要（中）：

用于形成由下列化学式表示的光致抗蚀剂膜的粘合剂化合物，其中R表示光致酸发生剂。

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