发明申请
US20050161826A1 Multilayer circuit devices and manufacturing methods using electroplated sacrificial structures 有权
多层电路器件和使用电镀牺牲结构的制造方法

Multilayer circuit devices and manufacturing methods using electroplated sacrificial structures
摘要:
A multilayer circuit includes a dielectric base substrate, conductors formed on the base substrate and a vacuum deposited dielectric thin film formed over the conductors and the base substrate. The vacuum deposited dielectric thin film is patterned using sacrificial structures formed by electroplating techniques. Substrates formed in this manner enable significant increases in circuit pattern miniaturization, circuit pattern reliability, interconnect density and significant reduction of over-all substrate thickness.
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