发明申请
- 专利标题： Immersion liquids for immersion lithography
- 专利标题（中）： 用于浸没式光刻的浸液
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申请号： US10763467申请日： 2004-01-22
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公开(公告)号： US20050164502A1公开(公告)日： 2005-07-28
- 发明人: Hai Deng , Yueh Wang , Huey-Chiang Liou , Hok-Kin Choi , Robert Meagley , Ernisse Putna
- 申请人： Hai Deng , Yueh Wang , Huey-Chiang Liou , Hok-Kin Choi , Robert Meagley , Ernisse Putna
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/302 ; H01L21/461
摘要：
Compositions for immersion liquid materials and associated immersion lithography systems and techniques. Examples of polymer or oligomer-based immersion liquids are described to exhibit superior material properties for immersion lithography in comparison with water and some other commonly-used immersion liquids. In addition, certain material additives may be added to water and water-based immersion liquids to improve the performance of the immersion liquids in immersion lithography.
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