Invention Application
- Patent Title: Methods of manufacturing electron-emitting device, electron source, and image display apparatus
- Patent Title (中): 制造电子发射器件,电子源和图像显示装置的方法
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Application No.: US11082785Application Date: 2005-03-18
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Publication No.: US20050164591A1Publication Date: 2005-07-28
- Inventor: Hironobu Mizuno , Takashi Iwaki , Toshihiko Takeda , Kazuya Miyazaki , Koki Nukanobu
- Applicant: Hironobu Mizuno , Takashi Iwaki , Toshihiko Takeda , Kazuya Miyazaki , Koki Nukanobu
- Applicant Address: JP TOKYO
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP TOKYO
- Priority: JP054342/2002 20020228; JP022953/2003 20030131
- Main IPC: H01J9/02
- IPC: H01J9/02 ; H01J1/316 ; H01J9/00 ; H01J9/04 ; H01J9/24 ; H01J31/12

Abstract:
In a process of reducing a resistivity of a polymer film for carbonization in a surface conduction electron-emitting device, by irradiating an energy beam onto the polymer film, when an energy intensity of the beam given in a unit area in a unit time is assumed to be W W/m2, W satisfies a formula W≧2×T×(ρsub·Csub·λsub/τ)1/2, where T is defined as a temperature ° C. at which the polymer film is heated for one hour in a vacuum degree of 1×10−4 Pa to reduce a resistivity of the polymer film to 0.1 Ω·cm, Csub is a specific heat J/kg·K of the substrate, ρsub is a specific gravity kg/m3 of the substrate, λsub is a heat conductivity W/m·K of the substrate, and τ is an irradiation time in the range of 10−9 sec to 10 sec.
Public/Granted literature
- US07077716B2 Methods of manufacturing electron-emitting device, electron source, and image display apparatus Public/Granted day:2006-07-18
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