发明申请
- 专利标题： Charged beam writing apparatus and writing method
- 专利标题（中）： 带电波束写入装置和写入方式
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申请号： US10972710申请日： 2004-10-26
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公开(公告)号： US20050167615A1公开(公告)日： 2005-08-04
- 发明人: Masato Saito
- 申请人： Masato Saito
- 优先权： JP2003-366143 20031027
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; G21G5/00 ; H01J37/08
摘要：
A charged beam writing apparatus is disclosed, which comprises a shaped beam forming unit which shapes a charged beam radiated from a charged beam source into a beam of a desired shape by using at least two shaping masks each having a shaping aperture to form a shaped beam, a figure dividing unit which divides a contour portion of a pattern to be formed on an object layer into a plurality of figure portions having a predetermined area, a writing unit which writes the figure portions of the contour portion by using a shaped beam of the predetermined area, and a focus control unit which performs focusing of the beam radiated from the charged beam source, by using a shaped beam having the same area as that of the shaped beam which has the predetermined area and is used in writing of the figure portions of the contour portion.
公开/授权文献
- US07119348B2 Charged beam writing apparatus and writing method 公开/授权日：2006-10-10
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