- 专利标题： Immersion photolithography system and method using microchannel nozzles
-
申请号： US11053328申请日： 2005-02-09
-
公开(公告)号： US20050168713A1公开(公告)日： 2005-08-04
- 发明人: Herman Vogel , Klaus Simon , Antonius Maria Derksen
- 申请人： Herman Vogel , Klaus Simon , Antonius Maria Derksen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Holding N.V.
- 当前专利权人： ASML Holding N.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; G03F7/20 ; H01L21/02 ; H01L21/027 ; G03B27/52
摘要：
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
公开/授权文献
信息查询
IPC分类:
